Particle Optical System for SACP Crystal Orientation Analysis

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Solution Overview

Problem

Conventional SACP methods face limitations in accurately measuring the orientation and internal stress states of crystals due to difficulties in precisely controlling the angle of incidence and impingement location of charged particle beams, leading to suboptimal channeling pattern analysis.

Innovation Solution

A particle optical system with an objective lens, upstream and downstream beam deflectors, and an aberration corrector allows for independent adjustment of the angle of incidence and impingement location, enabling rapid and precise measurement of particle intensities at multiple angles, thereby enhancing the resolution and accuracy of selected area channeling patterns.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If the angle of incidence is varied to obtain channeling pattern information, then the measurement precision of crystal orientation is improved, but the impingement location on the object surface changes, leading to loss of spatial resolution

Engineering Contradiction:
Improvecrystal orientation measurementVSAvoidspatial resolution
Core Design Contradiction:
Measurement precisionVSManufacturing precision

Solution Approach 1:

The patent divides the beam path into multiple independent control sections: a first beam deflector for angle control and a second beam deflector for position control. This segmentation allows independent adjustment of incidence angle and impingement location, resolving the contradiction between obtaining angular channeling information and maintaining spatial resolution.

Inventive Principle:
Principle #1Segmentation

2Adaptability or versatility

If conventional beam deflectors are used to vary the angle of incidence, then the measurement of channeling patterns is enabled, but the impingement location on the sample surface cannot be kept constant, reducing measurement accuracy

Engineering Contradiction:
Improveangle of incidence variationVSAvoidimpingement location control
Core Design Contradiction:
Adaptability or versatilityVSMeasurement precision

Solution Approach 1:

The beam deflection system is segmented into two independent deflectors: the first deflector varies the angle of incidence while the second deflector compensates for position drift. This allows the system to adaptively vary angles while maintaining precise impingement location control.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The system uses feedback control where the second beam deflector is adjusted based on the angle variation introduced by the first deflector to maintain constant impingement location. This feedback mechanism ensures that location precision is preserved while angle adaptability is achieved.

Inventive Principle:
Principle #23Feedback

3Manufacturing precision

If the beam is focused to a point to achieve high spatial resolution, then the penetration depth decreases, reducing the channeling effect signal strength

Engineering Contradiction:
Improvespatial resolutionVSAvoidsecondary particles generated
Core Design Contradiction:
Manufacturing precisionVSQuantity of substance

Solution Approach 1:

The patent changes the beam parameters by using a collimated beam with larger spot size to increase penetration depth and secondary particle generation, while using beam deflectors to maintain angular precision. This parameter change allows simultaneous achievement of sufficient signal strength and angular measurement precision.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables the detection of particle intensities for at least 100 different angles of incidence at a constant impingement location, providing detailed channeling patterns and crystal properties analysis, even at large angles of incidence, with improved focusing and aberration correction.

Implementation Method 1

an objective lens for focusing the beam

Methodology Applied
Scientific EffectFocusing: Lens

Implementation Method 2

a first beam deflector located upstream of the objective lens in a beam path of the beam... adjusting an excitation of the first beam deflector for adjusting an angle of incidence of the beam on the object surface

Methodology Applied
Scientific EffectBeam deflection: Electromagnetic Induction

Implementation Method 3

an aberration corrector located between the first beam deflector and the objective lens in the beam path

Methodology Applied
Scientific EffectAberration correction:

Data Source

PatentEP2320217B1SACP method and particle optical system for performing the method
Publication Date: 2019.02.13 CARL ZEISS MICROSCOPY GMBH
  • EP2320217B1 patent drawingFigure 1
  • EP2320217B1 patent drawingFigure 2

AI summary

A SACP (selected area channeling pattern) method comprising: directing a beam (9) of charged particles onto an object surface (23) of an object (25) using a particle optical system (1); and detecting intensities of particles emanating from the object; wherein the method comprises: (a1) adjusting an excitation of a second beam deflector (17,19) for adjusting an impingement location (29) of the beam on the object surface; (a2) adjusting an excitation of a first beam deflector (11,13) for adjusting an angle (Ψ) of incidence of the beam on the object surface without changing the impingement location and detecting the intensity; and (a3) repeating the adjusting of the excitation of the first beam deflector for adjusting the angle of incidence without changing the impingement location such that a corresponding intensity is detected (35) for each of at least 100 different angles of incidence at the same impingement location. The application also relates to a charged particle optical system (1) for performing the method.