Salt Acid Generator for Resist Composition CD Uniformity
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Solution Overview
Problem
Existing resist compositions fail to achieve satisfactory CD Uniformity (CDU) in resist patterns, which is crucial for precise manufacturing processes.
Innovation Solution
A salt represented by formula (I) is used as an acid generator in a resist composition, combined with a resin having acid-labile groups, to form a resist pattern with improved CDU through a process involving application, drying, exposure, and heating.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional salts are used as acid generators in resist compositions, then the resist pattern can be formed, but the CD Uniformity (CDU) is insufficient
Solution Approach 1:
The patent changes the chemical parameters of the acid generator by introducing a specific salt structure with formula (I), where the cation contains a benzene ring with specific substituents (R1-R9) and the anion is a sulfonic acid anion, carboxylic acid anion, or sulfonylimide anion. This parameter change in the acid generator's molecular structure directly improves the CD Uniformity of the resist pattern while maintaining reliable pattern formation.
Solution Approach 2:
The patent uses a composite approach by combining a specific cation structure (with benzene ring and multiple substituents including hydroxy groups, alkoxy groups, or carboxy groups) with specific anion types (sulfonic acid anion, carboxylic acid anion, or sulfonylimide anion) to create an optimized acid generator. This composite material design achieves both satisfactory pattern formation and improved CD Uniformity.
2Ease of manufacture
If the acid generator structure is simplified, then the manufacturing process becomes easier, but the CD Uniformity deteriorates
Solution Approach 1:
The patent optimizes the molecular parameters of the acid generator by specifying particular substituent groups (R1-R9) on the benzene ring and particular anion types, achieving improved CD Uniformity without complicating the overall manufacturing process. The structured formula (I) provides a clear synthesis pathway that balances manufacturing ease with performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition using the salt achieves satisfactory CD Uniformity, enhancing the precision of resist patterns and manufacturing processes.
Implementation Method 1
a step of exposing the composition layer, and (4) a step of heating the exposed composition layer
Data Source
AI summary
Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:wherein R1, R2 and R3 each represent a hydroxy group, *—O—R10, *—O—CO—O—R10, etc.; L10 represents an alkanediyl group; R10 represents an acid-labile group; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1, A2 and A3 each represent a hydrocarbon group which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5; and AI− represents an organic anion.