Novel Salt Acid Generator for Resist CD Uniformity
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing resist compositions fail to achieve satisfactory CD uniformity in resist patterns, which is crucial for precise microfabrication processes.
Innovation Solution
A novel salt represented by formula (I) is introduced, which forms the basis of an acid generator and resist composition, enhancing CD uniformity through specific structural units and acid-labile groups in the resist composition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing salts are used as acid generators in resist compositions, then the resist pattern can be formed, but the CD uniformity is insufficient
Solution Approach 1:
The patent modifies the molecular structure of the salt by changing parameters such as the hydrocarbon group chain length (A1 and A2 with 2-20 carbon atoms), the number of repeating units (m1, m2, m4, m5, m7, m8), and the substitution patterns of halogen atoms and hydrocarbon groups on the benzene ring. These parameter changes in the salt's chemical structure optimize the generated acid's properties to improve CD uniformity while maintaining reliable pattern formation
Solution Approach 2:
The patent creates a composite acid generator system by combining the novel salt with specific resist composition components including resin having acid-labile groups, solvents, and other additives. This composite formulation works synergistically to achieve both high CD uniformity and reliable pattern formation, resolving the contradiction between these two requirements
2Manufacturing precision
If the salt structure is modified to improve CD uniformity, then the manufacturing precision increases, but the device complexity increases
Solution Approach 1:
The patent systematically varies parameters within defined ranges (A1 and A2: 2-20 carbon atoms, m1: 1-5, m2: 0-5, m4: 0-5, m5: 0-5, m7: 0-4, m8: 0-5) to optimize CD uniformity. By establishing clear parameter ranges and relationships (1≤m1+m7≤5, 0≤m2+m8≤5), the patent achieves precision improvement without uncontrolled structural complexity
Solution Approach 2:
The salt molecule is segmented into distinct functional regions: the benzene ring core with halogen substitutions (R4-R8), the hydrocarbon chain spacers (A1 and A2), and the repeating units with specific stoichiometry (m1-m8). This segmentation allows independent optimization of each region's contribution to CD uniformity while managing overall molecular complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The novel salt-based resist composition achieves improved CD uniformity in resist patterns, enabling more precise microfabrication processes.
Implementation Method 1
an acid generator comprising the salt according to any one of (1) to (8)
Data Source
AI summary
Provided are a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), an acid generator, and a resist composition comprising the same. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition comprising the same:wherein R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1 and A2 each represent a hydrocarbon group, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; ml represents an integer of 1 to 5, m2, m4, m5 and m8 represent an integer of 0 to 5, m7 represents an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5; and AI− represents an organic anion.