Salt Acid Generator for Resist Composition Pattern Resolution
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Solution Overview
Problem
Current resist compositions using acid generators face limitations in achieving precise control over acid generation and pattern formation during the production of resist patterns, particularly in terms of acidity and pattern resolution.
Innovation Solution
A salt represented by formula (I) is used as an acid generator in a resist composition, combined with a resin having acid-labile groups, which undergoes specific structural units and a method involving application, drying, exposure, and heating steps to produce a resist pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional acid generators are used in resist composition, then acid generation occurs during exposure, but the acidity control and pattern resolution are insufficient
Solution Approach 1:
The patent changes the chemical parameters of the acid generator by using a specific salt structure (formula I) with defined substituents R1-R10 and stoichiometric ratios (m1-m8). This structural parameter change enables precise control over the acidity and acid generation characteristics, directly improving both pattern resolution and acidity control reliability
Solution Approach 2:
The patent employs a composite acid generator system consisting of the salt of formula (I) combined with a resin having acid-labile groups. This composite material approach allows the salt to provide controlled acid generation while the resin provides the necessary resist properties, achieving both high pattern resolution and reliable acidity control
2Manufacturing precision
If acid generation is increased to improve pattern formation, then pattern quality improves, but control over acid generation becomes difficult
Solution Approach 1:
The patent utilizes parameter changes in the salt structure (formula I), specifically the stoichiometric ratios m1-m8 and substituent types, to modulate acid generation intensity. By adjusting these parameters, the patent achieves high pattern formation quality while maintaining controllable acid generation through systematic structural variation
Solution Approach 2:
The salt of formula (I) acts as an intermediary between the exposure energy and the acid-labile groups in the resin. It mediates the acid generation process by converting exposure energy into controlled acid release, enabling high pattern quality while simplifying control through the intermediary's designed chemical properties
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The salt effectively generates acid with controlled acidity, enhancing the precision and quality of resist pattern formation, improving the resolution and stability of the resist composition.
Implementation Method 1
an acid generator, a resist composition and a method for producing resist pattern... The salt effectively generates acid with controlled acidity
Implementation Method 2
a resin having an acid-labile group... which undergoes specific structural units
Data Source
AI summary
A salt represented by formula (I):wherein R1 and R2 each independently represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10; L1 represents an alkanediyl group having 1 to 6 carbon atoms; R4, R5, R7 and R8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; R10 represents an acid-labile group; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI− represents an organic anion.