Salt Acid Generator for Chemically Amplified Resist Resolution
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Solution Overview
Problem
Current chemically amplified resist compositions for semiconductor microfabrication fail to produce patterns with improved resolution and pattern profiles, despite the use of acid generators like triphenylsulfonium 1-adamantanemethoxycarbonyldifluoromethansufonate and p-tolyldiphenylsulfonium perfluorooctanesulfonate.
Innovation Solution
A salt of the formula (I) is developed, where ring Y is a monocyclic or polycyclic hydrocarbon group with specific substitutions, and Q1 and Q2 represent fluorine or perfluoroalkyl groups, used as an acid generator in a chemically amplified resist composition, along with a resin containing an acid-labile group that becomes soluble in alkali upon acid action.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional acid generators (triphenylsulfonium 1-adamantanemethoxycarbonyldifluoromethansufonate, p-tolyldiphenylsulfonium perfluorooctanesulfonate) are used in chemically amplified resist compositions, then the resist composition can be formed, but the pattern resolution and pattern profiles are insufficient
Solution Approach 1:
The patent modifies the chemical structure of the acid generator by changing parameters such as the counterion structure (introducing specific hydrocarbon groups with 3-30 carbon atoms, fluorine atoms, or perfluoroalkyl groups) and the cation structure (using triphenylsulfonium, p-tolyldiphenylsulfonium, or naphthylphenylsulfonium). These parameter changes in the molecular structure enable the acid generator to produce patterns with improved resolution and pattern profiles while maintaining compositional stability.
2Manufacturing precision
If the acid generator structure is modified to improve pattern resolution, then manufacturing precision improves, but the chemical stability and reliability of the resist composition may be affected
Solution Approach 1:
The patent systematically varies structural parameters of the acid generator including the hydrocarbon group size (3-30 carbon atoms), substitution patterns (fluorine atoms, perfluoroalkyl groups), and cation types. These controlled parameter changes optimize both pattern resolution and compositional stability by selecting specific combinations that maintain chemical integrity while enhancing lithographic performance.
Solution Approach 2:
The acid generator is designed as a composite structure combining specific cations (triphenylsulfonium, p-tolyldiphenylsulfonium, naphthylphenylsulfonium) with specifically designed anions containing hydrocarbon groups, fluorine atoms, or perfluoroalkyl groups. This composite approach allows optimization of both resolution and stability through the synergistic combination of structurally stable cation and tailored anion components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The salt enhances the resolution and pattern profiles of chemically amplified resist compositions, making them suitable for advanced lithography processes like ArF excimer laser lithography, KrF excimer laser lithography, and ArF immersion lithography.
Implementation Method 1
a chemically amplified resist composition containing an acid generator comprising a compound generating an acid by irradiation
Data Source
AI summary
The present invention provides a salt of the formula (I):wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH2— group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows an integer of 0 to 12.The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).