Salt Acid Generator for Resist CD Uniformity
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Solution Overview
Problem
Existing resist compositions struggle to achieve satisfactory CD uniformity in resist patterns, which is crucial for semiconductor fine processing.
Innovation Solution
A salt represented by formula (I) is used as an acid generator in a resist composition, combined with a resin having acid-labile groups and specific structural units, and a method involving application, drying, exposure, and heating to produce a resist pattern with improved CD uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional acid generators are used in resist composition, then the resist pattern can be formed, but the CD uniformity is insufficient
Solution Approach 1:
The patent modifies the molecular structure of the acid generator by introducing specific structural elements (formula I with defined substituents and linkers) to change the acid generation characteristics and improve CD uniformity while maintaining pattern formation quality
Solution Approach 2:
The patent creates a composite acid generator system combining specific structural components (formula I with defined groups and linkers) to achieve both sufficient pattern formation and improved CD uniformity that cannot be achieved with conventional single-structure acid generators
2Manufacturing precision
If existing salt structures are used as acid generators, then the resist composition functions, but satisfactory CD uniformity cannot be achieved
Solution Approach 1:
The patent changes the structural parameters of the salt by defining specific substituents (formula I) and linkers to optimize acid generation properties for improved CD uniformity while preserving the essential functionality of the resist composition
Solution Approach 2:
The patent segments the salt structure into distinct functional components (formula I with defined groups, linkers, and substituents) that can be independently optimized to achieve both improved CD uniformity and maintained resist composition functionality
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition using salt (I) achieves satisfactory CD uniformity in resist patterns, enhancing the precision and quality of semiconductor processing.
Implementation Method 1
a salt for acid generator... an acid generator containing the salt... a resist composition and a method for producing a resist pattern... exposing the composition layer, and heating the exposed composition layer
Data Source
AI summary
A salt represented by formula (I) and a resist composition including the salt are described.wherein, in formula (I),Q1 and Q2 each independently represent a fluorine atom or the like,R1 and R2 each independently represent a hydrogen atom or the like,Z represents an integer of 0 to 6,X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O—,L1 represents a single bond or an alkanediyl group having 1 to 6 carbon atoms,A1 represents a divalent cyclic hydrocarbon group having 3 to 36 carbon atoms which may have a substituent,L2 represents a single bond, a carbonyl group or an alkanediyl group having 1 to 6 carbon atoms,A2 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms which may have a substituent,R3, R4 and R5 each independently represent a saturated hydrocarbon group having 1 to 6 carbon atoms, andZ+ represents an organic cation.