Salt Formula I for High-Resolution Resist Patterns
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Solution Overview
Problem
Existing resist compositions fail to produce resist patterns with sufficient resolution due to limitations in salt formulations.
Innovation Solution
A salt represented by formula (I) is developed, which includes specific structural units and acid-labile groups, used in an acid generator and resist composition to enhance pattern resolution during the resist pattern production process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional salt formulations are used in resist compositions, then the resist composition can be manufactured with standard formulations, but the resulting resist patterns do not achieve sufficient resolution
Solution Approach 1:
The patent applies parameter changes by modifying the chemical structure of the salt to include specific structural units (formula I) with defined molecular weights and acid-labile groups. This structural parameter change enables the salt to generate acid with appropriate strength and controllability, directly improving resist pattern resolution while maintaining formulation manageability
Solution Approach 2:
The patent employs composite materials by creating a salt with multiple functional components integrated into formula (I): aromatic rings for structural stability, alkanediyl groups for flexibility, and acid-labile groups for controlled acid generation. This composite structure allows the single salt to perform multiple functions, improving resolution without requiring complex multi-component formulations
2Ease of manufacture
If the salt structure is simplified for ease of manufacture, then manufacturing becomes easier, but the resist pattern resolution deteriorates
Solution Approach 1:
The patent applies segmentation by dividing the salt structure into distinct functional modules in formula (I): the aromatic ring system (with可控 substituents), the alkanediyl linker (L1 with 1-6 carbon atoms), and the acid-labile group (R10). Each module can be independently optimized and synthesized, then assembled into the final salt structure, balancing manufacturing ease with high-resolution performance
3Manufacturing precision
If acid generation is increased to improve pattern definition, then resist pattern resolution improves, but side reactions and damage to the resist composition increase
Solution Approach 1:
The patent applies parameter changes by incorporating acid-labile groups (R10) into the salt structure at controlled positions and quantities (m1, m2, m4, m5, m7, m8 parameters). This allows precise control over acid generation timing and intensity - the acid is generated only when needed during the resist process, providing sharp pattern definition while minimizing premature side reactions and resist damage through controlled parameter adjustment
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The salt composition improves resist pattern resolution by incorporating specific structural units and acid-labile groups, resulting in a resist composition that effectively forms high-resolution patterns.
Implementation Method 1
a step of exposing the composition layer
Data Source
AI summary
A salt represented by formula (I), an acid generator, a resin, and a resist composition including the same.wherein R1 and R2 each represent a hydroxy group, etc.; R4, R5, R7 and R8 each represent a halogen atom, etc.; R10 represents an acid-labile group; A1 and A2 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represents an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5; Qb1 and Qb2 each represent a hydrogen atom, etc.; Lb1 represents a saturated hydrocarbon group; Yb1 represents a single bond or an alicyclic hydrocarbon group; Rbb1 represents a hydrogen atom, etc.; X10 represents a single bond, etc.; and L10 represents a single bond or a hydrocarbon group.