SAM Removing Liquid Tuned by Hansen Parameters for Selective Removal
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Solution Overview
Problem
Conventional methods for removing self-assembled monolayers (SAMs) from substrates, such as using acetic acid, are insufficient in terms of selective removal accuracy and efficiency, particularly in the context of semiconductor manufacturing where high precision is required.
Innovation Solution
A self-assembled monolayer removing liquid is developed, positioned within specific Hansen solubility parameter spheres to enhance both dissolving and wetting properties, allowing for effective removal of SAMs by aligning with the solubility and affinity parameters of both the SAM and the substrate material, utilizing solvents like 1-butanol, 2-butanol, tetrahydrofuran, and benzyl alcohol.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If acetic acid is used to remove self-assembled monolayer, then the removal process can be performed, but the selective removal accuracy is insufficient
Solution Approach 1:
The patent changes the chemical parameters of the removing liquid by selecting solvents with specific Hansen solubility parameters that match both the SAM and substrate material. This parameter optimization enables selective removal with high accuracy while maintaining reliability, resolving the contradiction between removal accuracy and effectiveness.
Solution Approach 2:
The patent introduces an intermediary approach by using removing liquids that simultaneously interact with both the SAM and substrate material. The dual-affinity removing liquid acts as a mediator that selectively targets the SAM for removal while being compatible with the substrate, thereby achieving both high selective removal accuracy and removal effectiveness.
2Productivity
If conventional removing liquids are used, then the removal process is simple, but the removal efficiency is insufficient
Solution Approach 1:
The patent optimizes the composition parameters of the removing liquid by carefully selecting solvents with specific Hansen solubility parameters. This parameter-based approach achieves high removal efficiency while maintaining relatively simple liquid compositions, thus resolving the contradiction between removal efficiency and composition complexity.
Solution Approach 2:
The patent uses composite solvent systems combining multiple solvents (e.g., tetrahydrofuran and 1-butanol) that work synergistically. This composite approach enhances removal efficiency through combined dissolving and wetting actions while keeping the overall liquid composition manageable and practical for industrial application.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves improved selective removal performance of SAMs by balancing dissolving and wetting properties, ensuring effective removal without damaging underlying metal films, thus addressing the limitations of conventional methods.
Implementation Method 1
the self-assembled monolayer removing liquid has high affinity for the constituent molecules of the self-assembled monolayer and has a good dissolving property. Thus, the self-assembled monolayer removing liquid can dissolve the self-assembled monolayer well and remove the monolayer from the surface of the substrate
Implementation Method 2
the self-assembled monolayer removing liquid has high affinity for the self-assembled monolayer and has good wettability. Thus, when the self-assembled monolayer removing liquid comes into contact with the self-assembled monolayer, the self-assembled monolayer removing liquid can wet well the self-assembled monolayer and can spread on the surface of the self-assembled monolayer
Data Source
AI summary
The present invention is a self-assembled monolayer removing liquid for selectively removing a self-assembled monolayer provided on a surface of a substrate, the removing liquid having a Hansen solubility parameter positioned in a first Hansen sphere of a material for forming the self-assembled monolayer and in a second Hansen sphere of the self-assembled monolayer, the first Hansen sphere being defined by a center value (δd1, δp1, δh1) [MPa1/2] and a sphere radius R1 [MPa1/2] in a Hansen solubility parameter space, the second Hansen sphere being defined by a center value (δd2, δp2, δh2) [MPa1/2] and a sphere radius R2 [MPa1/2] in the Hansen solubility parameter space.