Sample Lift-Out Attachment Using Sputter Redeposition in Vacuum
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Solution Overview
Problem
Current charged particle microscopy systems face challenges in attaching and manipulating highly reactive samples due to contamination risks, complex processing steps, and degradation caused by traditional precursor gases, which limit their suitability for imaging and investigation.
Innovation Solution
A method and system where a sample manipulator with high sputter yield material is milled using a charged particle beam to form attachment bonds with the sample without the need for precursor gases, allowing for the attachment and imaging of highly reactive materials within charged particle microscopy systems.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If traditional precursor gases are used to attach samples to manipulators, then attachment bonds can be formed, but the sample surface degrades and the sample becomes more reactive to charged particle beams
Solution Approach 1:
The patent removes the precursor gas step entirely from the attachment process. Instead of using external materials to form attachments, the system uses direct mechanical manipulation and localized material transfer between the manipulator and sample, eliminating the harmful chemical reactions that cause sample degradation while maintaining effective attachment bond formation
Solution Approach 2:
The patent maintains a high vacuum environment throughout the attachment process, creating an inert atmosphere that prevents unwanted chemical reactions. This vacuum environment protects highly reactive samples from contamination and degradation while allowing attachment to proceed through physical rather than chemical mechanisms
2Strength
If precursor gases or liquids are introduced into the chamber, then attachment can be achieved, but contamination of optical components and unwanted deposits on the sample increase
Solution Approach 1:
The patent extracts and eliminates the use of precursor gases and liquids from the attachment process. By using direct mechanical attachment methods in a vacuum environment, the system prevents contamination of optical components and unwanted deposits on the sample while still achieving secure attachment bonds
Solution Approach 2:
The system uses the sample manipulator's own material (through controlled wear or transfer) to create the attachment bond, rather than requiring external precursor materials. This self-service approach eliminates the introduction of additional materials into the chamber, preventing contamination while maintaining attachment functionality
3Ease of manufacture
If complex gas or liquid introduction mechanisms are added, then attachment processes can be performed, but device complexity and difficulty of implementation increase
Solution Approach 1:
The patent removes complex gas and liquid introduction mechanisms from the system. By using simple mechanical manipulation and localized material transfer in a vacuum environment, the system achieves attachment capability without adding device complexity, making the system easier to manufacture and implement
Solution Approach 2:
The patent replaces complex chemical delivery systems (gas/liquid introduction mechanisms) with simpler mechanical manipulation methods. This substitution eliminates the need for tailored gas/liquid delivery hardware while maintaining attachment functionality through direct physical interaction between the manipulator and sample
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach minimizes sample damage, reduces contamination, and simplifies the attachment process, enabling the imaging and investigation of highly reactive materials without introducing additional materials into the microscopy chamber, thus enhancing the reliability and accuracy of the imaging process.
Implementation Method 1
milling portions of the sample manipulator such that material that is removed via the milling redeposits to form an attachment between the sample manipulator and the sample
Data Source
AI summary
Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.