Sample Map Modeling for Accurate Semiconductor Defect Assessment

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Solution Overview

Problem

Existing sample assessment methods for semiconductor IC chips suffer from reduced throughput due to inaccuracies in pattern defect detection, which are exacerbated by deviations in field region shapes and positions, leading to difficulties in locating features of interest.

Innovation Solution

A method and system for generating a sample map using fitted models to represent positions and shapes of field regions, incorporating exposure correction data from a lithographic apparatus, to improve the accuracy and efficiency of defect assessment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If traditional surveying methods (total station, GPS) are used to create as-built maps, then measurement precision can be achieved, but productivity is reduced due to manual data collection and processing requirements

Engineering Contradiction:
Improveas-built map accuracyVSAvoiddata collection speed
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent uses aerial imagery to create a digital copy of the construction site, replacing traditional physical surveying methods. The system captures images from aircraft or satellites and processes them to generate as-built maps, eliminating the need for manual data collection with total stations or GPS devices while maintaining measurement precision through automated image processing algorithms

Inventive Principle:
Principle #26Copying

Solution Approach 2:

The patent replaces mechanical surveying equipment (total stations, GPS receivers) with an optical-electronic system consisting of aerial cameras and computer processing. The mechanical process of manual measurement and map drafting is substituted with automated image capture and digital processing, significantly improving productivity while maintaining or enhancing measurement precision

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If detailed as-built maps are created using traditional methods, then manufacturing precision of the map data is improved, but loss of time in data collection and processing increases

Engineering Contradiction:
Improvemap data accuracyVSAvoiddata processing time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The system performs preliminary action by capturing comprehensive aerial imagery of the entire construction site in a single pass before detailed analysis begins. This pre-capture of all necessary data from multiple angles and elevations eliminates the need for repeated site visits and manual measurements, reducing time loss while ensuring all details are captured for precise map generation

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent implements continuous useful action through automated, continuous image processing from the captured aerial photographs. The system continuously generates as-built maps, cross-sections, and volume calculations from the image data without interruption, eliminating the discontinuous manual measurement and drafting processes that cause time delays while maintaining manufacturing precision of the map data

Inventive Principle:
Principle #20Continuity of useful action

Data Source

PatentEP4449483B1Method of generating a sample map, computer program product
Publication Date: 2026.04.15 ASML NETHERLANDS BV
  • EP4449483B1 patent drawingFigure 1
  • EP4449483B1 patent drawingFigure 2
  • EP4449483B1 patent drawingFigure 3

AI summary

Methods are disclosed for generating a sample map and processing a sample. In one arrangement, a method comprises measuring a position of a first mark in each of a plurality of field regions on sample. A first model is fitted to the measured positions of the first marks. The fitted first model represents positions of the field regions. The method comprises measuring positions of a plurality of second marks in one field region or in each of a plurality of field regions. A second model is fitted to the measured positions of the second marks. The fitted second model represents a shape of each field region. A sample map is output using the fitted first and second models.