Sample Support Edge Detection Using Negative-Field FIB Imaging
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Solution Overview
Problem
Existing techniques for identifying the edge of a sample support in scientific instruments, such as dual beam systems combining focused ion beam (FIB) devices and electron microscopes (EM), are manual, inaccurate, and prone to error, leading to difficulties in accurately attaching samples and requiring excessive material removal.
Innovation Solution
The implementation of a system that applies a negative field during imaging by a dual beam system, causing a repulsive charge that enhances the contrast between signal regions, allowing for automatic and precise identification of the sample support edge.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If manual techniques are used to identify the edge of a sample support, then the process can be performed with simple equipment, but the accuracy and precision of edge identification deteriorates
Solution Approach 1:
A negative field is introduced as an intermediary element during imaging to repel secondary charged particles from the sample support background. This creates enhanced contrast between the sample support edge and the surrounding area, enabling accurate automatic edge detection without requiring complex manual intervention
Solution Approach 2:
The patent replaces manual mechanical edge identification with an automatic detection system that uses negative field application and image processing algorithms. This substitution eliminates human error in edge identification while maintaining system feasibility through integration with existing dual beam instrumentation
2Manufacturing precision
If manual edge identification is used, then the attachment process can proceed, but excessive material removal is required
Solution Approach 1:
Automatic edge identification using negative field imaging and image processing algorithms provides precise determination of the sample support edge location. This accuracy enables precise sample attachment positioning, minimizing the need for excessive material removal while ensuring correct sample placement
3Productivity
If manual techniques are used for edge identification, then the process setup is simpler, but the attachment process requires more time and human intervention
Solution Approach 1:
The negative field serves as a mediator that enhances edge contrast during imaging, enabling automatic detection algorithms to accurately identify the sample support edge. This integration with existing dual beam systems improves attachment process efficiency without requiring completely new equipment
Solution Approach 2:
The system performs self-service through automatic edge detection and identification using negative field imaging and integrated image processing algorithms. This automation eliminates the need for manual edge identification, reducing human intervention time while leveraging existing system capabilities
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables more efficient and accurate identification of the sample support edge, leading to improved sample placement, reduced material removal, and increased automation in the attachment process.
Implementation Method 1
affects a set of secondary charged particles, emitted from the sample support due to the ion beam, by directing activation of a negative field during application of the ion beam by the FIB device
Data Source
AI summary
Embodiments herein relate to sample support imaging and sample location identification at a sample support to be used for microscopy imaging. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a beam directing component that instructs a focused ion beam (FIB) device of a beam system to direct an ion beam at a sample support, and a field application component that affects secondary charged particles, emitted from the sample support due to the ion beam, by directing activation of a negative field from the beam system during application of the ion beam by the FIB device.