SAW Resonator Electrode Structure for Clutter Suppression Alignment

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Solution Overview

Problem

In surface acoustic wave (SAW) devices, alignment deviations during the photolithography process can lead to incomplete alignment of protruded metal blocks with interdigital electrodes, affecting clutter suppression and filter performance.

Innovation Solution

The surface acoustic wave resonator device integrates protruding structures with the body structure of interdigital electrodes, eliminating the interface between them and ensuring complete vertical alignment, thereby improving clutter suppression and filter performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If the protruded metal block is formed through a lift-off process after the interdigital electrode is formed, then the protruded metal block can be added to suppress clutter, but alignment deviation occurs between the protruded metal block and the interdigital electrode, affecting clutter suppression effect

Engineering Contradiction:
Improveclutter suppression effectVSAvoidalignment accuracy
Core Design Contradiction:
Object-affected harmful factorsVSManufacturing precision

Solution Approach 1:

The patent merges the formation of the protruded metal block with the interdigital electrode formation process. Both structures are formed simultaneously in the same photolithography and evaporation process, eliminating the need for a separate lift-off process. This ensures that the protruded metal block and interdigital electrode are formed from the same material layer with perfect alignment, resolving the alignment deviation issue while maintaining clutter suppression functionality

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent performs the formation of the protruded metal block structure as a preliminary action during the interdigital electrode formation process itself, rather than as a subsequent step. By preparing both structures together in advance using the same photolithography pattern, the alignment accuracy is ensured before any potential misalignment can occur in later processes

Inventive Principle:
Principle #10Preliminary action

2Ease of manufacture

If the photolithography process is used to form the protruded metal block, then the metal can be deposited on the end of the interdigital electrode, but the window width variation and alignment deviation cause inconsistent clutter suppression effect

Engineering Contradiction:
Improvemetal deposition processVSAvoidperformance consistency
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent combines the formation of the protruded metal block with the interdigital electrode formation into a single integrated process step. The same photolithography pattern defines both the interdigital electrode and the protruded metal block, ensuring that variations in window width or alignment do not affect the relative positioning between these two structures, thereby ensuring consistent performance

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enhances the alignment accuracy and consistency of protruding structures with interdigital electrodes, resulting in improved clutter suppression and consistent performance of SAW resonators and filters.

Implementation Method 1

In the structure of a surface acoustic wave (SAW) device

Methodology Applied
Scientific EffectSurface acoustic wave: Surface Acoustic Wave

Implementation Method 2

an interdigital transducer, located on the base substrate and including

Methodology Applied
Scientific EffectPiezoelectric effect: Piezoelectric Effect

Data Source

PatentUS20250080084A1Surface acoustic wave resonator device and manufacturing method therefor, and filter
Publication Date: 2025.03.06 SHENZHEN NEWSONIC TECH CO LTD
  • US20250080084A1 patent drawing
  • US20250080084A1 patent drawing
  • US20250080084A1 patent drawing

AI summary

The present disclosure provides a surface acoustic wave resonator device and manufacturing method therefor, and filter, the surface acoustic wave resonator device includes: an interdigital transducer located on a base substrate and including: first and second interdigital electrode lead-out parts; a plurality of first interdigital electrodes; and a plurality of second interdigital electrodes, disposed to be offset and parallel to the plurality of first interdigital electrodes, each interdigital electrode includes a body structure and a protruding structure which are integrally formed, the protruding structure is disposed at an end portion of the each interdigital electrode and protruded from a surface of the body structure at a side away from the base substrate in a third direction perpendicular to the base substrate, wherein the protruding structure and the body structure have sidewalls aligned with each other in the third direction.