Scanner Control System Optimizing Exposure Tool Throughput
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Solution Overview
Problem
Existing exposure tools in semiconductor processing incur inefficiencies due to the inclusion of non-exposure fields in the scanner route, which increases processing times and reduces throughput in semiconductor fabrication facilities.
Innovation Solution
A scanner control system generates an optimized scanner route for exposure recipes by omitting non-exposure fields, thereby reducing the distance traveled by the substrate stage and minimizing processing time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If non-exposure fields are included in the scanner route, then the substrate stage can systematically traverse all fields, but the processing time increases and throughput decreases
Solution Approach 1:
The patent extracts and removes non-exposure fields from the scanner route, creating an optimized route that includes only die exposure fields. This extraction eliminates unnecessary traversals through non-exposure fields, reducing processing time while maintaining systematic coverage of actual exposure fields.
Solution Approach 2:
The patent segments the scanner route into distinct components: exposure fields that require processing and non-exposure fields that do not. By segmenting the route and selectively including only relevant fields, the system achieves faster processing without compromising the systematic traversal of actual exposure fields.
2Productivity
If non-exposure fields are omitted from the scanner route, then processing time is reduced, but the complexity of route generation increases
Solution Approach 1:
The patent applies preliminary action by pre-identifying and classifying fields as either exposure fields or non-exposure fields before route generation. This pre-classification allows the route generation algorithm to systematically exclude non-exposure fields without adding significant complexity, as the field types are already determined from the exposure field map.
Solution Approach 2:
The patent incorporates feedback mechanisms where the scanner control system receives the exposure field map, processes it to identify field types, and generates the optimized scanner route accordingly. This feedback loop ensures that the route generation algorithm adapts to the specific field configuration while maintaining efficient processing.
3Productivity
If the scanner route is optimized to exclude non-exposure fields, then throughput increases, but the control system complexity increases
Solution Approach 1:
The patent applies universality by designing a scanner control system that can handle both traditional routes including non-exposure fields and optimized routes excluding them. The control system uses a unified approach to process exposure field maps and generate appropriate scanner routes, making the system versatile and adaptable without requiring separate control mechanisms.
Solution Approach 2:
The patent implements dynamics by enabling the scanner control system to adaptively generate optimized routes based on the specific exposure field map configuration. The system dynamically adjusts the scanner route according to the distribution and positions of die exposure fields versus non-exposure fields, optimizing throughput for each specific case while maintaining a consistent control architecture.
Data Source
AI summary
Some implementations described herein provide an exposure tool and associated methods of operation in which a scanner control system generates a scanner route for an exposure recipe such that the distance traveled by a substrate stage of the exposure tool along the scanner route is reduced and/or optimized for non-exposure fields on a semiconductor substrate. In this way, the scanner control system increases the productivity of the exposure tool, reduces processing times of the exposure tool, and increases yield in a semiconductor fabrication facility in which the exposure tool is included.