Lithographic Scanner OPC Matching via Digital Modeling
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Solution Overview
Problem
Lithographic scanners face challenges in matching optical proximity correction (OPC) behavior due to variations in lens design and laser parameters, leading to costly and time-consuming processes when switching between different scanners or manufacturers, as Optical Proximity Correction (OPC) solutions often fail to work consistently across different equipment setups.
Innovation Solution
A method and system that use lithographic modeling to match the settings of a scanner to another reference scanner by running models for multiple settings, providing adjustments to closely match the output of the target tool, utilizing non-linear optimization and threshold matching techniques to characterize and adjust scanner settings without requiring proprietary information or reticles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If manual OPC matching is performed between different scanners, then manufacturing precision can be achieved, but time consumption and cost increase significantly
Solution Approach 1:
The patent creates a digital copy of the reference scanner's optical characteristics through lithographic modeling. The model replicates the target scanner's imaging behavior, allowing virtual testing and optimization without physical reticle iterations. This digital copying eliminates the need for repeated manual OPC adjustments on different scanners.
Solution Approach 2:
The patent performs preliminary lithographic modeling to predict and optimize OPC behavior before actual manufacturing runs. By simulating the imaging process and adjusting OPC parameters in advance using the trained model, the system prepares optimal settings that can be directly applied, avoiding time-consuming trial-and-error matching when switching scanners.
2Manufacturing precision
If manual OPC matching is performed between different scanners, then manufacturing precision can be achieved, but cost increases due to reticle requirements
Solution Approach 1:
The system creates a digital replica of scanner optical characteristics through modeling, replacing the need for physical reticles in the matching process. The lithographic model captures the essential imaging behavior, allowing OPC optimization without consuming proprietary reticle patterns or requiring expensive test reticles to be manufactured and shipped between facilities.
Solution Approach 2:
The patent introduces a lithographic model as an intermediary between the scanner hardware and the OPC optimization process. This model acts as a mediator that translates scanner-specific optical characteristics into actionable OPC parameters, eliminating the need for direct physical comparison using proprietary reticles between different scanner systems.
3Adaptability or versatility
If lithographic modeling is used to match scanner settings, then adaptability to different manufacturers improves, but device complexity increases
Solution Approach 1:
The patent employs parameter-based lithographic modeling that captures scanner optical characteristics through a set of measurable parameters. By training the model on these parameters and adjusting them to match target scanner behavior, the system achieves adaptability across different manufacturers without requiring complex hardware modifications. The parameter-driven approach simplifies the adaptation process compared to full system redesign.
Data Source
AI summary
A system and methods are provide for modeling the behavior of a lithographic scanner and, more particularly, a system and methods are provide using thresholds of an image profile to characterize through-pitch printing behavior of a lithographic scanner. The method includes running a lithographic model for a target tool and running a lithographic model on the matching tool for a plurality of different settings using lens numerical aperture, numerical aperture of the illuminator and annular ratio of a pattern which is produced by an illuminator. The method then selects the setting that most closely matches the output of the target tool.