Scanning Exposure Apparatus Coordinated Pattern Movement
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Solution Overview
Problem
Existing exposure apparatuses face challenges in improving throughput and device productivity due to the time required for pattern return operations during scanning exposure, even when using multiple patterns, which limits the effectiveness of using two or more patterns in photolithography processes.
Innovation Solution
A scanning type exposure apparatus with a control system that synchronously moves multiple patterns and a substrate in coordinated directions to expose shot regions using multiple exposure lights, allowing for continuous movement and reduced return time, thereby enhancing throughput and productivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple patterns are used for sequential exposure, then exposure capacity increases, but throughput does not improve due to return operation time
Solution Approach 1:
The patent applies preliminary action by having the first pattern perform a return operation to the exposure start position in advance, before the second pattern completes its scanning exposure. This preparatory movement ensures that the first pattern is ready to immediately resume exposure without waiting for the second pattern, thereby eliminating idle time and improving throughput while maintaining increased exposure capacity
Solution Approach 2:
The patent implements continuity of useful action by coordinating the timing and movements of multiple patterns such that exposure operations continue without interruption. The control apparatus schedules the first pattern's return operation to coincide with the second pattern's exposure, ensuring that at least one pattern is always actively exposing, thus maintaining continuous productive action and preventing downtime
2Reliability
If pattern return operations are performed during scanning exposure, then pattern positioning is maintained, but device productivity is limited
Solution Approach 1:
The first pattern performs its return operation to the exposure start position as a preliminary action before the second pattern finishes exposure. This advance positioning ensures pattern alignment reliability is maintained while the timing coordination prevents productivity loss, as the return operation occurs during the second pattern's active exposure phase
Solution Approach 2:
The patent applies dynamics by implementing flexible, coordinated control of multiple patterns' movements and timing. The control apparatus dynamically adjusts the scheduling of return operations and scanning exposures, allowing patterns to move and position themselves at optimal times that balance positioning requirements with continuous productivity, rather than following rigid sequential operations
Data Source
AI summary
An exposure apparatus restricts reduction in throughput. The exposure apparatus controls movement such that, (1) when a substrate is moving in one direction, a first pattern is moved in a specified direction to expose a first shot region using a first exposure light, then movement of the substrate in the one direction continues while moving the second pattern in the specified direction to expose a second shot region, and (2) then the respective movement directions of the substrate and the second pattern are reversed to expose a third shot region using the second exposure light, then movement of the substrate in the reverse direction continues while moving the first pattern in a direction that is the reverse of the specified direction to expose a fourth shot region using the first exposure light.