Scanning Exposure Stage Profiles for Throughput and Positioning Accuracy
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Solution Overview
Problem
Existing exposure apparatuses face a tradeoff between throughput and positioning error during scanning exposure of substrates, with conventional techniques either prioritizing throughput at the expense of positioning accuracy or vice versa.
Innovation Solution
The exposure apparatus employs a driving profile that includes first and second constant acceleration sections with a connection section in between, where the acceleration changes smoothly and continuously, allowing for improved throughput while reducing positioning errors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If scanning exposure is performed while accelerating and/or decelerating the substrate to improve throughput, then productivity increases, but positioning error of the substrate increases
Solution Approach 1:
The driving profile is segmented into distinct sections: acceleration sections, constant velocity sections, and deceleration sections. Each section is optimized independently - acceleration sections use lower acceleration values to maintain positioning accuracy, while constant velocity sections operate at higher speeds to improve throughput. This segmentation allows the system to achieve both high productivity and low positioning error by combining different motion regimes throughout the scanning cycle.
Solution Approach 2:
The patent employs dynamic adjustment of acceleration and velocity parameters throughout the scanning process. The driving profile continuously adapts the substrate's motion characteristics - using lower acceleration during critical exposure phases and higher velocities during transition phases. This dynamic control enables the system to optimize both positioning precision and throughput by matching the substrate's motion state to the specific operational requirements of each phase.
2Manufacturing precision
If scanning exposure is performed at constant velocity to maintain positioning accuracy, then manufacturing precision is maintained, but productivity decreases
Solution Approach 1:
The patent implements periodic alternation between different motion regimes - alternating between acceleration sections, constant velocity sections, and deceleration sections. This periodic action allows the substrate to spend sufficient time at constant velocity for accurate exposure while also incorporating acceleration and deceleration phases to improve overall throughput. The rhythmic pattern of speed variations enables both precision and productivity goals to be achieved.
Solution Approach 2:
The patent changes key motion parameters (acceleration and velocity) at different stages of the scanning process. By adjusting these parameters dynamically - using lower acceleration during exposure-critical phases and higher velocities during transition phases - the system optimizes both positioning accuracy and throughput. This parameter variation allows the substrate to move faster overall while maintaining precision during critical operations.
Data Source
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AI summary
The present invention provides an exposure apparatus (10) for performing scanning exposure on each of a plurality of shot regions in a substrate (S), comprising: a stage (15a) configured to hold the substrate; a driver (15b) configured to drive the stage; and a controller (18) configured to control the scanning exposure on each of the plurality of shot regions while controlling the driver in accordance with a driving profile, wherein the driving profile includes a first section in which the stage is driven at a constant acceleration in a first direction, a second section in which the stage is driven at a constant acceleration in a second direction opposite to the first direction, and a connection section connecting the first section and the second section, and a period in which the scanning exposure is performed includes at least a part of the connection section.