Scanning Probe Inspection for In-Process Wafer Yield Screening

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Solution Overview

Problem

Integrated circuit manufacturing involves time-consuming and costly inspections to determine device quality, which can be improved by applying scanning probe microscopy during the fabrication process to detect defects and optimize processing.

Innovation Solution

Implementing scanning probe microscopy to collect topological and conductance data from substrates during the manufacturing process, allowing for real-time diagnostic determinations to selectively apply or skip manufacturing processes, thereby reducing waste and improving yield.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If inspections are performed on finished devices to assure quality, then device quality is improved, but manufacturing cost increases and throughput decreases

Engineering Contradiction:
Improvedevice qualityVSAvoidthroughput
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent applies scanning probe microscopy inspections at intermediate stages during the fabrication process rather than waiting until finished devices are complete. This preliminary inspection approach allows defects to be detected early, enabling selective application of additional manufacturing processes only to substrates that need them, thereby improving throughput while maintaining quality standards.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If inspections are performed on finished devices to assure quality, then device quality is improved, but manufacturing cost increases

Engineering Contradiction:
Improvedevice qualityVSAvoidmanufacturing cost
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

By performing scanning probe microscopy inspections at intermediate fabrication stages rather than on finished devices, the patent enables early defect detection. This allows manufacturers to selectively apply additional processes only to substrates that need them, reducing waste of manufacturing resources on defective substrates and lowering overall manufacturing costs while maintaining quality.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent enables selective application of manufacturing processes to specific substrates or regions based on inspection results. Rather than uniformly processing all substrates through additional manufacturing steps, the system applies processes locally only where needed, optimizing resource allocation and reducing manufacturing costs.

Inventive Principle:
Principle #3Local quality

3Productivity

If scanning probe microscopy is applied during fabrication to detect defects early, then throughput is improved, but device complexity increases

Engineering Contradiction:
ImprovethroughputVSAvoidprocess complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent implements a feedback loop where scanning probe microscopy inspection results directly inform subsequent manufacturing process decisions. The inspection data feeds into a system that automatically determines which substrates require additional manufacturing processes, creating a closed-loop control system that improves throughput through intelligent process selection.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces costs and increases throughput by enabling early detection of defects and optimizing processing, ensuring only high-quality substrates proceed to further manufacturing stages.

Implementation Method 1

scanning a portion of the substrate surface with a scanning probe microscope to obtain data

Methodology Applied
Scientific EffectScanning probe microscopy: Scanning Probe Microscopy

Data Source

PatentUS12131957B2Manufacturing process with atomic level inspection
Publication Date: 2024.10.29 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12131957B2 patent drawing
  • US12131957B2 patent drawing
  • US12131957B2 patent drawing

AI summary

Costs may be avoided and yields improved by applying scanning probe microscopy to substrates in the midst of an integrated circuit fabrication process sequence. Scanning probe microscopy may be used to provide conductance data. Conductance data may relate to device characteristics that are normally not available until the conclusion of device manufacturing. The substrates may be selectively treated to ameliorate a condition revealed by the data. Some substrates may be selectively discarded based on the data to avoid the expense of further processing. A process maintenance operation may be selectively carried out based on the data.