Scattering Element Crossed Linear Structures Radiation Expansion
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Solution Overview
Problem
Existing optoelectronic devices face challenges in expanding the radiation region of electromagnetic radiation effectively, particularly due to susceptibility to contamination and wetting, and require complex diffractive optical elements with structure sizes matching the wavelength of radiation.
Innovation Solution
A scattering element with crossed linear structures in two layers, arranged at a predefined angle, provides a simple and effective means to expand the radiation region, utilizing structures with heights greater than 10 μm and wave shapes to achieve uniform deflection and reduced contamination susceptibility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If diffractive optical elements with structure size in the region of the wavelength are used, then the radiation region can be expanded, but the device becomes complex and susceptible to contamination and wetting
Solution Approach 1:
The patent changes the key parameter of structure size from wavelength-scale (diffractive elements) to much larger dimensions (linear structures with height > 10 μm). This parameter change enables the same radiation expansion function to be achieved with simpler, more robust structures that are insensitive to contamination and easier to manufacture.
2Area of stationary object
If diffractive optical elements with structure size in the region of the wavelength are used, then the radiation region can be expanded, but the device becomes susceptible to contamination and wetting
Solution Approach 1:
By changing the structure size parameter from wavelength-scale to much larger dimensions (height > 10 μm), the patent makes the scattering element insensitive to contamination and wetting. The larger structures dominate the optical interaction, rendering surface contaminants negligible in comparison.
3Object-affected harmful factors
If crossed linear structures with height greater than 10 μm are used, then the device is less susceptible to contamination and wetting, but the structure must be produced with specific precision
Solution Approach 1:
The patent specifies a minimum height threshold (> 10 μm) rather than requiring precise control within a narrow range. This partial specification approach provides manufacturing tolerance, allowing structures to be produced with sufficient but not excessive precision, simplifying the manufacturing process while maintaining the desired insensitivity to contamination.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables efficient and uniform expansion of the radiation region, reducing radiance and enhancing the production simplicity of the scattering element, while maintaining mechanical stability and allowing for flexible production methods.
Implementation Method 1
A scattering element with crossed linear structures in two layers, arranged at a predefined angle, provides a simple and effective means to expand the radiation region
Implementation Method 2
utilizing structures with heights greater than 10 μm and wave shapes to achieve uniform deflection
Data Source
AI summary
In an embodiment, an arrangement includes an optoelectronic device including a plurality of components configured to generate electromagnetic radiation, wherein the components are arranged in a grid having identical spacings and a scattering element for expanding a radiation region of the electromagnetic radiation of the device, the scattering element comprising a first layer having first linear structures, the first structures being arranged parallel to one another and a second layer having second linear structures, the second linear structures being aligned parallel to one another, wherein the first linear structures and the second linear structures are arranged at a predefined angle of between 1° and 179°, wherein the first linear structures and/or the second linear structures constitute wave peaks and wave valleys, wherein adjacent wave valleys and adjacent wave peaks constitute a periodic spacing, and wherein the periodic spacing deviates at most by 20% from a multiple of the periodic spacing of the components.