Schottky Diode with Segmented Doping Regions

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Solution Overview

Problem

Schottky diodes experience reverse leakage current issues that negatively impact performance and efficiency, and reducing doping concentration to mitigate this also slows down startup speed.

Innovation Solution

A Schottky diode structure with a lightly doped region and a heavily doped region positioned on opposite sides of a gate structure, along with specific contact connections, to minimize reverse leakage current while maintaining fast startup speed.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-generated harmful factors

If the doping concentration of the lightly doped semiconductor material is reduced to lower reverse leakage current, then the reverse leakage current decreases, but the startup speed of the Schottky diode is lowered

Engineering Contradiction:
Improvereverse leakage currentVSAvoidstartup speed
Core Design Contradiction:
Object-generated harmful factorsVSSpeed

Solution Approach 1:

The patent applies local quality by creating distinct doping regions with different concentrations within the semiconductor structure. Specifically, it forms a lightly doped region (first doping concentration) and a heavily doped region (second doping concentration, higher than the first) in different areas of the semiconductor layer. This allows the lightly doped region to reduce reverse leakage current while the heavily doped region maintains fast startup speed, resolving the contradiction by assigning different doping characteristics to different local areas rather than using a uniform doping concentration throughout.

Inventive Principle:
Principle #3Local quality

2Object-generated harmful factors

If a lightly doped region is used to reduce reverse leakage current, then reverse leakage current is reduced, but the device complexity increases due to additional doping regions

Engineering Contradiction:
Improvereverse leakage currentVSAvoiddoping region structure
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

The patent applies segmentation by dividing the semiconductor layer into multiple doped regions with different doping concentrations. The semiconductor layer is segmented into a lightly doped region and a heavily doped region, each serving specific functions. This segmentation allows the device to achieve low reverse leakage current through the lightly doped region while maintaining manufacturing feasibility through the structured division of doping zones, balancing performance improvement with manageable device complexity.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The structure effectively reduces reverse leakage current and maintains fast operating speed by utilizing a lower doping concentration for the lightly doped region and a gate structure to prevent elongated operating times.

Implementation Method 1

a gate structure on a part of the lightly doped region, wherein the gate structure includes a gate electrode and a gate dielectric layer

Methodology Applied
Scientific EffectElectric Field: Electric Field

Implementation Method 2

A metal contacting a lightly doped semiconductor material may form a contact structure similar to a P-N junction (Schottky contact), which may serve as a Schottky diode

Methodology Applied
Scientific EffectSchottky barrier:

Data Source

PatentUS9530900B1Schottky diode and method for manufacturing the same
Publication Date: 2016.12.27 VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
  • US9530900B1 patent drawing
  • US9530900B1 patent drawing
  • US9530900B1 patent drawing

AI summary

A Schottky diode is provided, which includes a well of a first conductive type and a lightly doped region of a second conductive type on the well, wherein the first conductive type is opposite to the second conductive type. The Schottky diode includes a heavily doped region of the second conductive type on the well, and a gate structure on a part of the lightly doped region. The gate structure includes a gate electrode and a gate dielectric layer. The lightly doped region not covered by the gate structure and the heavily doped region are disposed at two opposite sides of the gate structure, respectively. The Schottky diode includes a first contact electrically connecting the heavily doped region and a first electrode, a second contact electrically connecting the gate electrode and a second electrode, and a third contact electrically connecting the lightly doped region and the second electrode.