Scintillator Activator Gradient for X-ray Image Sensitivity

The patent applies local quality by creating a non-uniform activator density distribution within the scintillator. Specifically, the activator density is made higher in the light emission region (near the photodetector) and lower in the light propagation region (farther from the photodetector). This localized variation optimizes luminescence output where needed while preserving crystallinity in regions where high activator density would cause disorder and light scattering.

The patent implements local quality by spatially varying the activator density to different regions of the scintillator. The high activator density is concentrated in the light emission region close to the photodetector where sensitivity is most needed, while the light propagation region maintains lower activator density to minimize light absorption and scattering, thereby preserving MTF.

The patent applies parameter changes by carefully controlling the vapor deposition process parameters, particularly the substrate temperature and deposition rate. By optimizing these parameters, the patent achieves formation of scintillator crystals with flat front ends that are resistant to damage during pasting, while avoiding excessive thermal deformation of the support structure.

The patent implements preliminary action by pre-forming the scintillator crystals with flat front ends during the vapor deposition process. This preliminary shaping of the crystal structure before the pasting step ensures that the crystals can withstand the pressing forces applied during adhesion without damage, while still achieving uniform contact with the sensor board.