Scintillator Planarization via Intermediary Resin Layer
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Solution Overview
Problem
Existing methods for manufacturing scintillators with abnormally grown portions result in decreased Detective Quantum Efficiency (DQE) and Modulation Transfer Function (MTF) due to the need for significant interspaces between the scintillator and sensor array, and are costly and prone to damage or deterioration.
Innovation Solution
A method involving the growth of columnar crystals on a base, followed by forming a first protection film to cover the scintillator layer, planarizing it through polishing, and then forming a second protection film to cover the first, which includes polishing the abnormally grown portion to form a continuation surface, thereby preventing damage and improving mechanical strength and moisture protection.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Shape
If pressure is applied to planarize the scintillator surface, then the surface flatness is improved, but the scintillator may be damaged
Solution Approach 1:
A resin layer is introduced as an intermediary between the scintillator and the pressing plate. This resin layer has softer properties than the scintillator, allowing it to deform and fill gaps during pressing, thereby planarizing the surface without transmitting excessive stress that would damage the scintillator structure
Solution Approach 2:
The pressing conditions are optimized by controlling the pressing force within a specific range (0.1-10 MPa) and temperature (20-200°C). By adjusting these parameters, the resin layer achieves effective planarization while the scintillator remains undamaged
2Ease of manufacture
If an abnormally grown portion exists in the scintillator layer, then crystal growth is simplified, but Detective Quantum Efficiency and Modulation Transfer Function decrease
Solution Approach 1:
The abnormally grown portion is selectively removed through controlled polishing. The resin layer protects normal crystal regions while the polishing process removes the abnormal portion, extracting only the harmful element while preserving the functional crystal structure
Solution Approach 2:
The pressing and polishing processes are applied locally to the abnormally grown region rather than uniformly across the entire scintillator. This localized treatment corrects the specific defect while maintaining the quality of normally grown crystal regions
3Shape
If all fluorescent columnar crystals are exposed by polishing, then abnormal growth is corrected, but the crystals deteriorate due to water exposure
Solution Approach 1:
The resin layer is applied to the scintillator surface before the polishing process. This preliminary protective action ensures that during subsequent polishing and handling, the crystal surfaces are shielded from water and other harmful environmental factors
Solution Approach 2:
The resin layer serves as a protective intermediary between the crystal surface and the external environment (water, air). It allows the crystal to be exposed for polishing while simultaneously protecting it from deterioration during and after the process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the production of high-quality scintillators with improved DQE and MTF while reducing manufacturing costs and preventing damage from pressure or water exposure.
Implementation Method 1
A scintillator can be manufactured by, for example, growing a plurality of columnar crystals on a base
Implementation Method 2
planarizing the first protection film, the planarizing including a polishing process of polishing the first protection film
Data Source
AI summary
A method of manufacturing a scintillator, includes growing a scintillator layer constituted by a plurality of column crystals on a base, forming a first protection film so as to cover the scintillator layer, planarizing the first protection film, the planarizing including a polishing process of polishing the first protection film, and forming a second protection film configured to cover the first protection film that has undergone the planarizing. The scintillator layers grown on the base include an abnormally grown portion. In the polishing process, a front end of the abnormally grown portion is polished as well as a surface of the first protection film so as to form a continuation surface by the surface of the first protection film and a surface of the abnormally grown portion.