Scintillator Window for Plasma VUV Detection
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Solution Overview
Problem
Existing substrate processing technologies face challenges in effectively monitoring and detecting vacuum ultraviolet (VUV) light emitted from plasma during semiconductor processing, which is crucial for optimizing plasma states and substrate processing outcomes.
Innovation Solution
A substrate processing system is designed with a process chamber, a window, and a scintillator layer that converts VUV light into visible light, allowing for detection using an optical emission spectrometer (OES). This system includes a detection apparatus with light transmitting units to transmit and analyze both visible and VUV light emitted from the plasma.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a scintillator layer is coupled to the window to convert VUV light into visible light, then VUV light detection capability is improved, but device complexity increases due to additional components
Solution Approach 1:
A scintillator layer is introduced as an intermediary substance between the VUV light source and the detection system. The scintillator converts invisible VUV light into visible light that can be detected by standard optical emission spectrometers, enabling VUV detection without requiring specialized detectors.
Solution Approach 2:
The patent replaces the need for complex specialized VUV detection systems with a simpler configuration using a scintillator layer coupled with standard optical detection equipment. This substitution reduces the complexity of the detection system while maintaining or improving detection capability.
2Measurement precision
If the scintillator layer covers the entire window surface, then VUV light conversion is maximized, but visibility of visible light from plasma is reduced
Solution Approach 1:
The window surface is divided into distinct functional zones: a first area covered by the scintillator layer for VUV light conversion, and a second exposed area for visible light transmission. This segmentation allows both VUV and visible light detection capabilities to coexist without mutual interference.
Solution Approach 2:
Different regions of the window are assigned different optical properties: the scintillator-covered region optimizes VUV conversion while the exposed region maintains visible light transparency. This local differentiation of functional properties enables simultaneous detection of both light types.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system enables accurate and efficient detection of VUV light by converting it into visible light, which can be analyzed using existing OES technology, thereby simplifying the design and improving the monitoring of plasma states during substrate processing.
Implementation Method 1
a scintillator layer used to convert vacuum ultraviolet light (VUV) emitted from the plasma in the process space into visible light
Data Source
AI summary
A substrate processing apparatus includes a process chamber providing a process space, a stage located in the process chamber and configured to support a substrate, a window coupled to a side of the process chamber, and a scintillator layer coupled to one side surface of the window. The scintillator layer covers a portion of the one side surface of the window which is less than the full window surface. A second surface corresponding to another portion of the one side surface of the window is exposed. Light emitted by a plasma in the process space passes through the window and is collected by an optical system and analyzed. Ultraviolet light passing through the scintillator is converted to longer wavelength, generally visible, light. Comparing the light passing through the bare window with the light passing through the scintillator layer enables analysis of the plasma.