Alkaline Fluid Supply for Scrub Brush Zeta Potential Control
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Solution Overview
Problem
Existing substrate treatment apparatuses face inefficiencies in removing foreign matter due to changes in zeta potential of scrub brushes, leading to accumulation and reduced cleaning effectiveness, especially on the first substrate after a standby period.
Innovation Solution
Incorporating an alkaline fluid supplying mechanism to maintain the scrub brush surface at a pH higher than 7, preferably not lower than 9, both during scrubbing and in standby periods, ensuring the scrub brush and foreign matter maintain a negative zeta potential, preventing foreign matter accumulation and improving cleaning efficacy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If deionized water is supplied to the scrub brush in the standby period, then the scrub brush is rinsed to remove foreign matter, but the zeta potential of the scrub brush surface changes to positive, causing foreign matter accumulation on the first substrate
Solution Approach 1:
The patent changes the pH parameter of the fluid supplied to the scrub brush from neutral (deionized water) to alkaline (pH higher than 7, preferably not lower than 9). This parameter change maintains the zeta potential of the scrub brush surface at negative values, preventing foreign matter accumulation while still achieving effective rinsing during standby periods
Solution Approach 2:
The patent applies alkaline fluid to the scrub brush surface in advance during standby periods before the actual substrate cleaning operation. This preliminary action ensures the scrub brush surface is pre-conditioned with the correct zeta potential, preventing foreign matter accumulation from the very first substrate cleaning operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach ensures consistent negative zeta potential for both the scrub brush and foreign matter, enhancing the reliability and efficiency of substrate cleaning by preventing foreign matter adherence and accumulation, thereby improving the overall cleaning process.
Implementation Method 1
maintain the scrub brush surface at a pH higher than 7, preferably not lower than 9, both during scrubbing and in standby periods, ensuring the scrub brush and foreign matter maintain a negative zeta potential
Data Source
AI summary
A substrate treatment apparatus includes a substrate holding mechanism which holds a substrate, a scrub brush for scrubbing a surface of the substrate held by the substrate holding mechanism to remove foreign matter from the substrate surface, a treatment liquid supplying mechanism which supplies an alkaline treatment liquid to the substrate surface when the substrate is scrubbed with the scrub brush, and an alkaline fluid supplying mechanism which supplies an alkaline fluid to a surface of the scrub brush in a standby period during which no substrate is scrubbed with the scrub brush.