Seal Cleaning Assembly for Metal Plating Apparatus

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Solution Overview

Problem

Metal accumulation on seals in plating apparatus degrades the electrical current path and the quality of plated metal layers in semiconductor manufacturing, highlighting a need for improved cleaning techniques for these components.

Innovation Solution

A cleaning assembly with a contactor, such as a brush, on an arm is used to automatically clean seals and other components, with the arm actuator moving the contactor into contact with the component, applying a cleaning liquid while rotating or stationary, and collecting used liquid to prevent contamination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If manual cleaning of seals is performed, then metal accumulation can be removed, but production time is lost and contamination risk increases

Engineering Contradiction:

Improveelectrical current path integrityVSAvoidproduction time

Core Design Contradiction:

ReliabilityVSProductivity

Solution Approach 1:

The cleaning system is integrated into the plating apparatus and automatically cleans seals during or between plating operations. The rotor continues to rotate during cleaning, and the seal is cleaned in-place without requiring removal or manual intervention, enabling the system to maintain itself during normal operation.

Inventive Principle:

Principle #25Self-service

Solution Approach 2:

The cleaning operation is performed proactively during the plating process or between batches, preventing metal accumulation before it degrades electrical performance. By cleaning the seal while the rotor is still rotating or immediately between operations, the system prevents contamination rather than reacting to it.

Inventive Principle:

Principle #10Preliminary action

2Reliability

If cleaning liquid is applied to the seal, then cleaning effectiveness is improved, but contamination of the plating bath increases

Engineering Contradiction:

Improveseal cleaning effectivenessVSAvoidplating bath contamination

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The cleaning liquid is applied locally to the seal surface and immediately removed via the collection mechanism. The system extracts the cleaning liquid and metal debris from the seal area, preventing them from entering the plating bath. The collection channel directs used cleaning liquid away from the bath environment.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

A collection mechanism acts as an intermediary between the cleaning process and the plating bath. This intermediary captures and removes cleaning liquid and debris, preventing direct contact between the cleaning agents and the plating bath, thus isolating the two processes.

Inventive Principle:

Principle #24Intermediary (Mediator)

3Productivity

If the cleaning assembly is integrated into the rotating rotor, then cleaning can be performed during operation, but mechanical complexity increases

Engineering Contradiction:

Improvecontinuous operation capabilityVSAvoidcleaning assembly integration

Core Design Contradiction:

ProductivityVSDevice complexity

Solution Approach 1:

The cleaning assembly is merged with the existing rotor structure, utilizing the rotor's rotation for both plating and cleaning functions. The contactor, cleaning liquid delivery, and collection mechanisms are integrated into the rotor's mechanical framework, combining two functions into one rotating assembly.

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The rotor serves dual functions: it rotates the substrate for plating operations and simultaneously enables seal cleaning through the integrated contactor and cleaning liquid delivery system. This multi-functionality eliminates the need for separate cleaning equipment and allows continuous operation.

Inventive Principle:

Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively removes contamination from seals and other components, maintaining the integrity of the electrical current path and improving the quality of plated metal layers by minimizing the release of cleaning liquids into the plating bath.

Implementation Method 1

A component cleaning assembly may be used to automatically clean the component. The cleaning assembly may have a contactor, such as a brush, on an arm.

Methodology Applied

Scientific EffectMechanical abrasion: Abrasion

Implementation Method 2

applying a cleaning liquid onto the component adjacent to the contactor

Methodology Applied

Scientific EffectChemical cleaning:

Implementation Method 3

At least some of the used cleaning liquid is collected

Methodology Applied

Scientific EffectGravity drainage: Gravitation

Data Source

PatentUS9309603B2Component cleaning in a metal plating apparatus

Publication Date: 2016.04.12 APPLIED MATERIALS INC

AI summary

A plating apparatus includes a vessel for holding a bath of plating liquid. A head is adapted to hold a work piece, such as a silicon wafer, in the vessel, with a seal on the head sealing against the work piece. A component cleaner assembly may be used to automatically clean a component of the plating apparatus, such as a seal or a contact ring. The cleaner assembly has a component contactor, such as a brush, on an arm. An arm actuator is linked to the arm for moving the arm from a retracted position, to a deployed position, where the contactor is in physical contact with the component. A method for cleaning a component of a plating apparatus includes moving a scrubber or contactor into contact with the component and applying a cleaning liquid onto the component adjacent to the contactor.