Sealed Transfer Chamber Layout for Wafer Contaminant Containment
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Solution Overview
Problem
In semiconductor manufacturing, contaminants such as fine particulates, organic substances, and metals on wafer surfaces can contaminate the entire wafer processing system, outside, or periphery due to leaks from wafer processing apparatuses, especially during emergency situations like excessive chemical supply, clogged exhaust lines, or improper airflow, leading to contamination of the transfer chamber and beyond.
Innovation Solution
A transfer chamber and wafer processing module design that includes a main robot, guide rail, and a frame with closers to seal opening regions, a buffer door for vertical movement, and airflow suppliers with exhaust pipes to prevent leakage by closing paths during emergencies, using O-rings and molding adhesives for sealing and forming airtight connections.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the transfer chamber is designed with open connection regions for wafer transfer, then wafer transfer efficiency is improved, but contaminant leakage risk increases
Solution Approach 1:
The transfer chamber is segmented into multiple isolated regions (process chamber connection region, buffer unit connection region, and exterior region) separated by closers. This segmentation allows selective closure of specific regions to prevent contaminant spread while maintaining transfer capabilities in other regions.
Solution Approach 2:
Closers act as intermediary elements between the process chamber, buffer unit, and exterior region. These closers can selectively open or close passage ways, serving as mediators that control contaminant flow while allowing legitimate wafer transfer when needed.
2Object-affected harmful factors
If closers are added to seal opening regions, then contaminant leakage is prevented, but device complexity increases
Solution Approach 1:
The closers serve multiple functions: they seal the transfer chamber to prevent contaminant leakage, divide the chamber into isolated regions, and can be selectively opened/closed for maintenance or emergency containment. This multi-functionality reduces the need for separate components for each purpose.
3Object-affected harmful factors
If the transfer chamber is completely sealed, then contaminant containment is improved, but operational flexibility deteriorates
Solution Approach 1:
The closers are designed to be dynamically adjustable, allowing the transfer chamber to transition between sealed and open states. This dynamic capability enables the system to adapt to different operational requirements while maintaining contaminant containment when needed.
Data Source
AI summary
Provided is a transfer chamber disposed between a buffer unit providing a space where wafers stay before being transferred, and process chambers each providing a space where a wafer processing process is performed, to transfer the wafers, the transfer chamber including a main robot for transferring the wafers between the buffer unit and the process chambers, or between the process chambers, a guide rail connected to the main robot to move the main robot, and a frame defining a space where the main robot and the guide rail of the transfer chamber operate, wherein a plurality of closers are connected to the frame to close a plurality of opening regions formed by the frame.