Security Label Tilt Effect via Embossed and Lithographic Patterns

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Solution Overview

Problem

Current anti-counterfeit carriers with optical security elements lack sufficient security against forgery due to limitations in resolution and individualization of motifs, particularly in mass production, where high writing speeds and throughput are desired.

Innovation Solution

Incorporating a combination of embossed and lithographic structures with a metallized layer, where a non-individual motif is embossed with a diffractive surface structure and an individual motif is introduced via laser lithography, featuring cutouts that form part of the non-individual motif, creating a tilt effect that changes visibility based on viewing angles.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a single high-resolution lithographic structure is used for individualization, then security against forgery is improved, but writing speed and throughput decrease

Engineering Contradiction:
Improvesecurity against forgeryVSAvoidwriting speed
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The optical security element is segmented into two distinct structures: an embossed diffraction grating structure that provides the base optical effect, and a separate lithographically applied individual motif that provides unique identification. This segmentation allows each structure to be optimized for its specific function and produced using the most suitable method for that function.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent combines two different production methods (embossing and lithography) and two different structure types (diffraction grating and individual motif) into a single integrated optical security element. The embossed structure provides the optical tilt effect while the lithographic structure provides individualization, and both are applied to the same metallized layer to create a unified security feature.

Inventive Principle:
Principle #5Merging (Combining)

2Manufacturing precision

If high-resolution structures are produced using electron beam lithography or dot matrix method, then manufacturing precision is improved, but production time and complexity increase

Engineering Contradiction:
ImproveresolutionVSAvoidproduction complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The embossed diffraction grating structure serves as a reusable master pattern that can be copied repeatedly through the embossing process. This master structure establishes the optical properties once, and then numerous identical copies are produced efficiently, reducing the complexity of producing high-resolution structures repeatedly.

Inventive Principle:
Principle #26Copying

3Productivity

If identical motifs are embossed in mass production, then productivity is improved, but security against forgery deteriorates due to lack of individualization

Engineering Contradiction:
Improvemass production efficiencyVSAvoidsecurity against forgery
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The optical security element features local quality differentiation: the embossed diffraction grating structure provides uniform optical properties across all elements, while the lithographically applied individual motif provides unique local characteristics to each specific element. This allows mass production of the base structure while adding individualization in a subsequent step.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances security by ensuring that the individual motif is recognizable at specific angles, while the non-individual motif shimmers at other angles, effectively increasing the difficulty of forgery and maintaining high resolution and visibility.

Implementation Method 1

a diffractive surface structure is produced on the non-individual motif

Methodology Applied
Scientific EffectDiffraction: Diffraction

Implementation Method 2

an individual motif is introduced into the metallized layer by laser lithography

Methodology Applied
Scientific EffectLaser ablation: Laser Ablation

Data Source

PatentUS10618341B2Security label with tilt effect
Publication Date: 2020.04.14 TESA SCRIBOS
  • US10618341B2 patent drawing
  • US10618341B2 patent drawing
  • US10618341B2 patent drawing

AI summary

An anti-counterfeit support with a series of optical security elements (6) and with a metallized layer in which a non-individual pattern (2) with a diffractive surface (3) is in each case embossed for at least two of the optical security elements (6) and in each of which an individual pattern (1) is incorporated by laser lithography, wherein the individual pattern (1) has recesses (4) which form at least a partial pattern of the non-individual pattern (2) and are arranged with precise alignment on the non-individual pattern (2), and the at least two optical security elements (6) each have an optical tilt effect between the individual pattern (1) and the non-individual pattern (2).