Seed Module Pulse Path Separation for Stable EUV Generation
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Solution Overview
Problem
Current semiconductor manufacturing technologies face challenges in achieving stability and productivity in extreme ultraviolet (EUV) light source systems, which are crucial for next-generation micro-fabrication, due to limitations in pulse control and interference between pulses in EUV light generation.
Innovation Solution
A semiconductor manufacturing apparatus and method utilizing a seed module with a pulse control optical system, including a lens, to control and stabilize the paths of first and second pulses from seed lasers, preventing overlap and ensuring precise amplification and collision to generate stable EUV light, thereby improving the stability and productivity of the EUV light source.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If pulses are allowed to travel along overlapping paths in the seed module, then the device structure can be simplified, but pulse interference occurs and EUV light generation stability deteriorates
Solution Approach 1:
The patent divides the pulse paths into separate non-overlapping trajectories within the seed module. The first pulse and second pulse are guided through distinct optical paths using mirrors and optical elements, preventing interference while maintaining manageable device complexity. This segmentation resolves the contradiction by isolating pulse trajectories spatially.
Solution Approach 2:
The patent utilizes spatial dimensionality to separate pulse paths. By configuring mirrors and optical elements to guide pulses through different three-dimensional trajectories that do not overlap, the system achieves stable EUV generation without requiring overly complex device structures. The dimensional separation allows independent pulse control.
2Reliability
If pulse control optical elements are added to prevent path overlap, then EUV light generation stability improves, but device complexity increases
Solution Approach 1:
The optical elements in the seed module serve multiple functions: they guide pulse trajectories, prevent path overlap, control pulse timing, and enable precise spatial positioning. By making these elements multi-functional, the patent reduces the need for additional separate components, thereby improving EUV stability without proportionally increasing device complexity.
Solution Approach 2:
The patent introduces optical elements as intermediaries between the pulse sources and the collision region. These intermediaries (mirrors, lenses, or other optical components) mediate the pulse paths to ensure non-overlapping trajectories while maintaining controlled interaction at the target. This intermediary approach achieves stability without requiring direct complex pulse-pulse control mechanisms.
3Productivity
If the first and second pulses are precisely controlled to collide with targets, then EUV light generation efficiency improves, but the difficulty of detecting and measuring pulse parameters increases
Solution Approach 1:
The patent implements feedback mechanisms to monitor and adjust pulse parameters such as timing, position, and intensity. By using feedback from detectors that measure pulse characteristics, the system maintains precise control over pulse collisions with targets, ensuring high EUV generation efficiency while managing the measurement difficulty through active correction systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the stability and productivity of the EUV light source by ensuring precise control and alignment of pulses, leading to improved EUV light generation and reduced interference, resulting in better micro-fabrication capabilities for next-generation semiconductors.
Implementation Method 1
an oscillation unit including a first seed laser, a second seed laser, and a seed module, wherein the first seed laser is configured to oscillate a first pulse, and wherein the second seed laser is configured to oscillate a second pulse
Implementation Method 2
an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light
Implementation Method 3
The third optical element may include a lens between the first optical element and the second optical element
Implementation Method 4
a plurality of mirrors configured to allow the first and second pulses to travel along first and second paths, respectively
Data Source
AI summary
Disclosed are semiconductor manufacturing apparatuses and operating methods thereof. The semiconductor manufacturing apparatus includes an oscillation unit that includes a first seed laser, a second seed laser, and a seed module, wherein the first seed laser oscillates a first pulse, and wherein the second seed laser oscillates a second pulse, and an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light. The seed module includes a plurality of mirrors configured to allow the first and second pulses to travel along first and second paths, respectively, and a pulse control optical system including a first optical element, a second optical element, and a third optical element. The pulse control optical system is on the second path that does not overlap the first path. The third optical element includes a lens between the first optical element and the second optical element.