Segmented Anode Bar Layout for Uniform Plasma Deposition

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Solution Overview

Problem

The uniformity of deposited films in electronic devices is compromised due to non-uniform plasma distribution in existing deposition apparatuses, leading to inconsistencies in film formation.

Innovation Solution

A deposition apparatus with a lattice-shaped shield member, bracket members, and anode bars, where the anode bars are spaced apart and protrude beyond the bracket members, creating a stable plasma environment for uniform film deposition, and a method involving a mask member to prevent film deposition on both sides of the substrate, ensuring even film formation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If plasma is used to sputter the target member, then film deposition can be achieved, but non-uniform plasma distribution causes poor film uniformity

Engineering Contradiction:
Improvefilm uniformityVSAvoidplasma uniformity
Core Design Contradiction:
Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The anode is divided into multiple segmented anode bars arranged in an array, allowing independent positioning and plasma distribution control. This segmentation enables uniform plasma generation across the target surface, directly addressing the plasma uniformity issue while improving film deposition quality

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Bracket members are introduced as intermediary components to physically separate the anode bars from the shield member. This intermediary structure stabilizes the anode bar positions and ensures consistent plasma distribution, resolving the contradiction between plasma uniformity and film quality

Inventive Principle:
Principle #24Intermediary (Mediator)

2Device complexity

If the anode bar is placed close to the shield member, then device complexity is reduced, but thermal expansion causes warpage and deflection

Engineering Contradiction:
Improvestructure simplicityVSAvoidstructural stability
Core Design Contradiction:
Device complexityVSStability of the object's composition

Solution Approach 1:

The bracket member serves as an intermediary between the anode bar and shield member, providing physical separation and structural support. This intermediary element prevents direct contact that would cause thermal warpage while maintaining a compact overall structure, thus not significantly increasing device complexity

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The bracket member is specifically designed to accommodate thermal expansion of the anode bar during plasma generation. By providing a support structure that allows for thermal movement, the design prevents warpage and deflection while maintaining structural stability

Inventive Principle:
Principle #37Thermal expansion

3Stability of the object's composition

If the anode bar protrudes beyond the bracket member, then plasma uniformity is improved, but the anode bar becomes vulnerable to damage

Engineering Contradiction:
Improveplasma uniformityVSAvoidanode bar durability
Core Design Contradiction:
Stability of the object's compositionVSStrength

Solution Approach 1:

The anode bar is designed with non-uniform geometry, protruding beyond the bracket member only in the central region where plasma uniformity is most critical. The end portions remain protected by the bracket member, providing localized plasma improvement while maintaining overall structural durability

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The bracket member provides selective protection, covering the vulnerable end portions of the anode bar while allowing the central protruding portion to optimize plasma distribution. This localized approach to protection and plasma generation resolves the contradiction between durability and plasma uniformity

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus and method enhance the uniformity of deposited films, reducing non-uniformity and particle creation, and accommodating thermal expansion to prevent warpage and deflection issues, resulting in improved film quality.

Implementation Method 1

The deposition apparatus may sputter a target member to deposit a film forming material of a target member on a substrate facing the target member

Methodology Applied
Scientific EffectSputtering: Sputtering

Implementation Method 2

Sputtering a target member is carried out with plasma

Methodology Applied
Scientific EffectPlasma: Plasma

Data Source

PatentUS12051569B2Deposition apparatus and deposition method using the same
Publication Date: 2024.07.30 SAMSUNG DISPLAY CO LTD
  • US12051569B2 patent drawing
  • US12051569B2 patent drawing
  • US12051569B2 patent drawing

AI summary

A deposition apparatus includes a shield member having a lattice shape in a plan view, the lattice shape including short side edges extending along a first direction and long side edges extending along a second direction, the short side edges including first and second short side edges, a bracket member including a first bracket member coupled to the first short side edge, and a second bracket member coupled to the second short side edge, a plurality of anode bars extending along the second direction and stably placed on each of the first bracket member and the second bracket member, and a target member covering the plurality of anode bars. An anode bar of the plurality of anode bars protrudes outward beyond at least one of the first bracket member and the second bracket member, and the anode bar is physically separated from the shield member by the bracket member.