Segmented Spiral Antenna Coil for High-Density Plasma Chambers
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing plasma generating devices face challenges in generating high-density plasma in larger containers due to limitations in coil length and resonance conditions, which restrict the capacity of the reaction container.
Innovation Solution
The device employs a spiral antenna coil divided into multiple parts, connected in parallel, with adjustable capacitors and inductors to maintain resonance and generate high-density plasma in a larger capacity container.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of stationary object
If the capacity of the container is increased, then the processing speed of the processing target is improved, but the coil length must be increased which narrows the room for selection of electric elements
Solution Approach 1:
The antenna coil is divided into multiple sections (first antenna coil and second antenna coil) that can be independently controlled. This segmentation allows each coil section to maintain appropriate length for resonance while collectively providing sufficient inductance for larger container capacities, thus resolving the contradiction between container size and coil design constraints.
2Volume of stationary object
If the coil length is increased to increase container capacity, then larger targets can be processed, but the resonance condition becomes difficult to satisfy with available capacitors
Solution Approach 1:
Dividing the antenna coil into multiple sections allows the total inductance to be distributed across several smaller inductance values. This makes it feasible to satisfy the resonance condition LC = 1/(4π²f²) with commercially available capacitors, while still providing sufficient total inductance for larger container capacities.
Solution Approach 2:
The patent introduces adjustable inductance means (variable inductors or adjustable coil configurations) that allow the inductance of each antenna coil section to be dynamically adjusted. This enables precise tuning to satisfy resonance conditions while adapting to different container sizes and processing requirements.
3Volume of stationary object
If a single long coil is used for large capacity containers, then plasma can be generated in larger volume, but plasma density decreases and uniformity is compromised
Solution Approach 1:
By dividing the antenna coil into multiple sections positioned at different locations within the container, plasma can be generated at multiple points simultaneously. This maintains high plasma density in each region while collectively covering a large volume, thus resolving the contradiction between plasma volume and density.
Solution Approach 2:
Multiple antenna coil sections work together in parallel to generate plasma throughout the large container volume. The combined effect of multiple plasma sources maintains high overall plasma density while covering the entire large processing volume, achieving both high density and large volume simultaneously.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for the generation of high-density plasma in a larger capacity container, enabling efficient plasma processing of larger targets with uniform plasma distribution and reduced interference between coils.
Implementation Method 1
An Inductively Coupled Plasma (ICP: Inductively Coupled Plasma) is generated by using a high-frequency circuit having an antenna coil which is an inductive load and a high-frequency power supply and supplying a high-frequency power to the antenna coil. The antenna coil induces a standing wave by resonating in a specific wavelength mode and generates an inductive field in the reaction container. As a result, the plasma is generated by the inductive coupling in the reaction container.
Implementation Method 2
The antenna coil induces a standing wave by resonating in a specific wavelength mode and generates an inductive field in the reaction container.
Data Source
AI summary
In order to enable generation of plasma with higher density in a container with larger capacity, a plasma generating device according to this disclosure is includes a high-frequency circuit (20) having an inductive load and a high-frequency power supply (22) which supplies high-frequency power to the inductive load and a reaction container which is configured capable of pressure reduction and in which plasma is generated by applying the high-frequency power to the inductive load. The inductive load is constituted by a spiral antenna coil (21) disposed so as to surround a periphery of the reaction container, and the antenna coil is divided into at least two or more parts. The high-frequency circuit (20) has a plurality of paths (23) on which each of the antenna coils (21) divided into at least two or more parts is provided.