Segmented Blocker Plate for ALD Substrate Process Chambers
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Solution Overview
Problem
Conventional blocker plates in substrate processing chambers exhibit high flow resistance, leading to premature introduction of the second precursor gas before the first precursor is fully purged, which can cause undesirable reactions between gases.
Innovation Solution
A blocker plate design featuring an annular rim, a central plate, and spokes is introduced to improve gas distribution and reduce flow resistance, ensuring that the first precursor is completely purged before the second is introduced, thereby minimizing gas phase reactions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If conventional blocker plates with many small holes are used to distribute precursors, then gas distribution is achieved, but flow resistance becomes high causing premature introduction of second precursor before first precursor is fully purged
Solution Approach 1:
The blocker plate is segmented into multiple functional zones: a central region with larger holes for high-flow precursor introduction, an intermediate region with medium-sized holes for moderate flow distribution, and a peripheral region with smaller holes for edge coverage. This segmentation allows different regions to handle gas flow at different rates, reducing overall flow resistance while maintaining comprehensive gas distribution across the substrate surface.
Solution Approach 2:
Different regions of the blocker plate are assigned different hole sizes and densities tailored to local flow requirements. The central region uses larger holes to accommodate higher precursor flux, while peripheral regions use smaller holes appropriate for lower flow demands. This local optimization reduces bottlenecks in high-flow areas while preventing excessive flow in low-demand areas, thereby reducing overall flow resistance and purge time without compromising distribution quality.
2Quantity of substance
If conventional blocker plates with many small holes are used, then precursor distribution coverage is improved, but flow resistance increases leading to undesirable gas phase reactions
Solution Approach 1:
The blocker plate divides the substrate coverage area into central, intermediate, and peripheral zones, each with appropriately sized holes. This segmentation ensures that precursor gases are distributed across the entire substrate surface while allowing sufficient flow rate to complete purging before the next precursor introduction, thereby maintaining reaction control reliability.
Solution Approach 2:
The blocker plate implements location-specific hole sizing where central regions have larger holes for high-flow precursors and peripheral regions have smaller holes for low-flow precursors. This local quality adjustment ensures comprehensive coverage across all substrate areas while preventing flow resistance from becoming high enough to cause premature precursor introduction and undesirable gas phase reactions.
3Loss of time
If blocker plate reduces flow resistance to allow complete purging, then purge time increases, but deposition uniformity and throughput are enhanced
Solution Approach 1:
By segmenting the blocker plate into zones with progressively smaller holes from center to periphery, the design optimizes flow resistance distribution. This allows the system to achieve complete precursor purging with minimal delay while maintaining high deposition throughput, as the segmented structure prevents flow bottlenecks without requiring excessive purge time.
Solution Approach 2:
The blocker plate applies local quality by matching hole sizes to local flow requirements: larger holes in central regions handle high-flow precursors efficiently, while smaller peripheral holes provide adequate coverage for low-flow precursors. This optimization enables the system to reduce purge cycle time compared to conventional uniform small-hole designs, thereby enhancing deposition throughput while maintaining uniformity.
Data Source
AI summary
Embodiments of a blocker plate for use in a substrate process chamber are disclosed herein. In some embodiments, a blocker plate for use in a substrate processing chamber configured to process substrates having a given diameter includes: an annular rim; a central plate disposed within the annular rim; and a plurality of spokes coupling the central plate to the annular rim.