Segmented Collector Mirror for EUV Light Generation
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Solution Overview
Problem
Existing EUV light generation apparatuses face challenges in efficiently reflecting and directing extreme ultraviolet light due to contamination accumulation on collector mirrors, which requires frequent cleaning and reduces operational efficiency.
Innovation Solution
A collector mirror configuration comprising a first, second, and third mirror with a semi-spherical shape, where the third mirror is detachably arranged between the first and second mirrors, allowing for targeted cleaning of the third mirror, which is prone to higher contamination, without disrupting the entire apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a single integrated collector mirror is used, then the structure is simple and easy to manufacture, but the entire mirror must be cleaned frequently due to contamination accumulation, reducing operational efficiency
Solution Approach 1:
The collector mirror is divided into multiple separate mirrors (first mirror, second mirror, third mirror) arranged in sequence. The third mirror, which is most prone to contamination, can be independently removed and cleaned without disassembling the entire apparatus, thus maintaining manufacturing simplicity while enabling selective maintenance to preserve operational efficiency.
Solution Approach 2:
The third mirror is designed to be detachably arranged between the first and second mirrors, allowing it to be extracted from the system for independent cleaning. This extraction principle enables targeted maintenance of the contamination-prone component without disrupting the entire mirror assembly or requiring shutdown of the whole apparatus.
2Stability of the object's composition
If the collector mirror is designed as a fixed integrated structure, then the alignment is stable, but cleaning requires disruption of the entire apparatus
Solution Approach 1:
The collector mirror assembly is segmented into multiple independently positionable mirrors. The third mirror can be detached for cleaning while the first and second mirrors remain in place, maintaining overall alignment stability while enabling easy cleaning operation. The segmented design allows the cleaned mirror to be reinstalled with minimal realignment.
Solution Approach 2:
The third mirror is designed with detachable arrangement, introducing dynamic reconfigurability to an otherwise stable optical system. This allows the system to transition between a stable operational state (all mirrors fixed) and a maintenance state (third mirror removed for cleaning), then return to operational state, combining stability with ease of cleaning.
3Reliability
If frequent cleaning of the entire collector mirror is performed, then contamination is removed, but operational time is lost and efficiency decreases
Solution Approach 1:
The third mirror is extracted as a separate, independently removable component from the collector mirror assembly. This allows targeted cleaning of only the contamination-prone third mirror rather than the entire apparatus, significantly reducing maintenance time and operational loss while maintaining mirror cleanliness and system reliability.
Solution Approach 2:
Instead of cleaning the entire collector mirror assembly, only the third mirror—which is most prone to contamination based on its position receiving material and laser— is removed and cleaned. This partial action principle reduces the time and effort required for maintenance while achieving sufficient cleanliness for reliable operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables efficient reflection and direction of EUV light while allowing for partial cleaning of the collector mirror, thereby improving the operational time and efficiency of the EUV light generation apparatus by isolating contamination to a removable component.
Implementation Method 1
The EUV light generated in the vessel may be reflected to an exposure chamber by a collector mirror
Implementation Method 2
The LPP type apparatus may generate the EUV light from high-density plasma formed by applying a laser beam to a material
Implementation Method 3
The LPP type apparatus may generate the EUV light from high-density plasma formed by applying a laser beam to a material
Implementation Method 4
A first nozzle for injecting an air to a surface of the first mirror may be formed on an upper portion of an inner surface of the first mirror
Data Source
AI summary
A collector mirror for an extreme ultraviolet (EUV) light generator includes a first mirror in a vessel, the vessel being configured to receive a material and a laser beam for generating the EUV light, a second mirror surrounding the first mirror, and a detachable third mirror between the first mirror and the second mirror, the third mirror having an inner diameter that is not smaller than an outer diameter of the first mirror, and an outer diameter that is not larger than an inner diameter of the second mirror.