Segmented EUV Radiation Collector for High Numerical Aperture
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Solution Overview
Problem
Current radiation collectors for extreme ultraviolet (EUV) lithographic apparatuses face challenges in efficiently directing and focusing EUV radiation due to limitations in the design of grazing incidence reflector shells, leading to obstructions and reduced intensity distribution at the far-field location, which affects the resolution and precision of pattern printing in microelectronics manufacturing.
Innovation Solution
The implementation of a radiation collector with multiple grazing incidence reflector shells configured to converge EUV radiation at distinct locations along the optical axis, creating separate intensity distributions with minimal overlap, allowing for a larger volume through which components can be positioned without obstructing the EUV beam, thereby increasing the maximum numerical aperture and reducing contamination risks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a single radiation collector is used to focus EUV radiation, then the radiation intensity at the focal point is high, but the volume available for positioning components without obstructing the beam is limited
Solution Approach 1:
The radiation collector is divided into multiple independent collector segments (first collector segment, second collector segment, etc.), each directing radiation to a separate focal point. This segmentation allows the system to maintain high radiation intensity at each focus while creating a larger overall volume for component positioning, as the focal points are spatially separated rather than concentrated at a single location.
Solution Approach 2:
The invention transitions from a single-point focal geometry to a multi-point focal geometry distributed in three-dimensional space. By separating focal points along the optical axis and in lateral dimensions, the system effectively utilizes additional spatial dimensions to accommodate components without obstructing the EUV beam paths.
2Manufacturing precision
If grazing incidence reflector shells are used to direct EUV radiation, then the radiation can be focused, but obstructions and contamination risks increase
Solution Approach 1:
By segmenting the radiation collector into multiple independent segments that focus radiation to separate points, the system reduces the risk of contamination and obstructions. Each segment operates independently with its own focal point, so contamination in one segment does not affect others, and the separated beam paths reduce mutual obstructions.
Solution Approach 2:
The multiple focal points act as intermediaries that distribute the radiation paths through different spatial regions. This intermediary approach allows beam delivery components to be positioned in the volume between and around the focal points without obstructing the primary radiation paths, thereby reducing obstructions and contamination risks.
3Manufacturing precision
If the numerical aperture is increased to improve resolution, then the pattern printing precision improves, but the heat load and contamination on components increase
Solution Approach 1:
The segmentation of the radiation collector into multiple segments with separate focal points distributes the radiation intensity across multiple locations rather than concentrating it at a single point. This reduces the heat load on any single component while maintaining high numerical aperture for improved resolution, as each segment can operate at high NA without overwhelming thermal burden on shared components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances the intensity and uniformity of EUV radiation at the far-field location, improving the resolution and precision of pattern printing in microelectronics manufacturing while minimizing contamination and heat load on components.
Implementation Method 1
a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to substantially converge in a first location
Data Source
AI summary
A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.