Segmented Filter for EUV Target Supply Nozzle Clogging
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Solution Overview
Problem
In semiconductor production, particularly for microfabrication with feature sizes of 32 nm or less, existing EUV light generation systems face challenges in preventing nozzle clogging due to foreign materials in the target material, which affects the reliability and efficiency of the target supply device.
Innovation Solution
A filter system comprising a first and second member with passable portions allows the target material to flow through channels, capturing foreign particles and preventing clogging, ensuring the target material's purity and flow through the nozzle.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a filter is used to prevent nozzle clogging by foreign materials, then the reliability of the target supply device is improved, but the complexity of the device increases
Solution Approach 1:
The filter is divided into a first member with a first passable portion and a second member with a second passable portion, where each member has a different opening area. This segmentation allows the filter to capture foreign materials of different sizes while maintaining a relatively simple overall structure that can be integrated into the existing nozzle system.
Solution Approach 2:
Different portions of the filter have different opening areas - the first passable portion has a larger opening area while the second passable portion has a smaller opening area. This local quality variation allows the filter to perform multiple functions (capturing different sized particles) within a single component structure, improving reliability without proportionally increasing complexity.
2Reliability
If the filter captures foreign particles effectively, then the purity of target material is improved, but the flow of target material through the filter may be restricted
Solution Approach 1:
The filter is segmented into multiple passable portions with different opening areas. The first passable portion with the larger opening area allows sufficient flow of target material, while the second passable portion with the smaller opening area provides effective particle capture. This segmentation balances the competing requirements of flow rate and particle capture efficiency.
Solution Approach 2:
The filter provides partial filtration through the first passable portion with larger openings that allow most target material to pass with minimal restriction, and more stringent filtration through the second passable portion with smaller openings. This partial action approach ensures adequate flow while still achieving the required purity level.
Data Source
AI summary
A filter may include: a first member having a first surface provided with a channel; and a second member set with a second surface thereof covering the channel. The first member may include a first passable portion that allows a fluid to pass between the first surface and a first space, which is defined beside a surface of the first member opposite to the first surface, through a first area of the channel. The second member may include a second passable portion that allows the fluid to pass between the second surface and a second space, which is defined beside a surface of the second member opposite to the second surface, through a second area of the channel distanced from the first area.