Segmented Finger Distal Edge for Lithography Illumination Uniformity
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Solution Overview
Problem
Lithographic apparatuses face challenges in achieving uniform illumination, leading to non-uniform intensity profiles that affect image quality and manufacturing efficiency, as existing uniformity correction systems struggle to modify finger parameters without altering radiation beam properties.
Innovation Solution
The introduction of a plurality of fingers with distal edges featuring at least two segments that form an indentation or teeth, allowing for adjustment of cross slot illumination to conform to a selected intensity profile, thereby improving uniformity across the illumination beam.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional uniformity correction systems use simple finger structures, then the device complexity is low, but the manufacturing precision of illumination uniformity is insufficient
Solution Approach 1:
The distal edge of each finger is divided into multiple segments (first segment, second segment, third segment) with different configurations. This segmentation allows each segment to independently control illumination uniformity in different regions, achieving higher manufacturing precision without requiring complex overall finger structures.
Solution Approach 2:
Different segments of the finger distal edge are designed with different properties (e.g., first segment has different configuration than second and third segments). This local differentiation enables precise control of illumination uniformity in specific regions while keeping other regions simple, resolving the contradiction between precision and complexity.
2Manufacturing precision
If finger parameters are modified to correct illumination non-uniformities, then the illumination uniformity improves, but the radiation beam properties are altered
Solution Approach 1:
The finger structure is designed with localized modifications only at the distal edge segments that interact with the radiation beam, while the rest of the finger maintains its original properties. This local modification approach corrects illumination uniformity without significantly altering the overall radiation beam properties, maintaining reliability.
Solution Approach 2:
By segmenting the distal edge into multiple sections with different configurations, the system can target specific illumination non-uniformities without affecting the entire finger structure or the overall beam properties, thus resolving the contradiction between improving uniformity and maintaining beam reliability.
3Manufacturing precision
If the illumination beam intensity profile is not controlled, then the device complexity is low, but the image quality deteriorates
Solution Approach 1:
The finger structure with segmented distal edge is designed to automatically control the illumination intensity profile through its geometric configuration. The different segments naturally create the desired intensity distribution without requiring complex external control systems, thereby improving image quality while keeping the device complexity manageable.
Data Source
AI summary
An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.