Segmented ICP Antenna Resonance for Plasma Uniformity
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing inductively coupled plasma (ICP) antennas in plasma-enhanced etching and deposition processes lack the ability to effectively control local plasma characteristics across semiconductor substrates, leading to non-uniform process outcomes.
Innovation Solution
A spatially tunable ICP antenna is developed, comprising a series of inductances and shunt capacitors forming LC tank circuits, allowing for localized control of plasma density and distribution by tuning resonant frequencies and magnetic fields.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional ICP antennas are used, then plasma generation is achieved, but spatial control of plasma characteristics is insufficient leading to non-uniform process outcomes
Solution Approach 1:
The ICP antenna is divided into multiple independently controllable coil segments that can be individually tuned. Each segment can generate plasma with different characteristics, enabling spatial control of plasma density and composition across the substrate surface to achieve uniform process outcomes.
Solution Approach 2:
Different segments of the antenna are tuned to different resonant frequencies, creating local variations in plasma characteristics. This allows specific regions of the substrate to receive plasma with optimized properties for their particular process requirements, improving overall process uniformity.
2Adaptability or versatility
If multiple independent coils are used to improve local plasma control, then spatial tuning capability is enhanced, but device complexity increases
Solution Approach 1:
Multiple coil segments are electrically connected in series to form a single integrated antenna structure. This merging approach maintains the spatial tuning capability of multiple independent coils while simplifying the overall device architecture and reducing the number of separate components required.
Solution Approach 2:
The segmented antenna structure serves multiple functions: it generates plasma, provides spatial control of plasma characteristics, and can be tuned to different resonant frequencies. This multi-functionality reduces the need for additional separate systems, thereby managing device complexity.
3Manufacturing precision
If coil segments are tuned to different resonant frequencies, then plasma density distribution is improved, but energy consumption increases
Solution Approach 1:
Not all coil segments need to operate at full power simultaneously. By tuning different segments to different resonant frequencies, only the segments required for specific process regions are actively engaged, reducing overall RF power consumption while maintaining plasma density uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables enhanced etch or deposition rates in specific regions of the substrate by spatially tuning plasma density, improving process uniformity and efficiency.
Implementation Method 1
The plasma may be created and sustained by inductive electric fields that are generated and controlled by coils external to the chamber. These coils are coupled with radio frequency voltage sources.
Implementation Method 2
A spatially tunable ICP antenna is developed, comprising a series of inductances and shunt capacitors forming LC tank circuits, allowing for localized control of plasma density and distribution by tuning resonant frequencies and magnetic fields.
Data Source
AI summary
Herein described is an apparatus comprising an inductively coupled plasma (ICP) antenna comprising a plurality of inductances electrically coupled in series, and a capacitor coupled in parallel with an inductance of the plurality of inductances. In at least one embodiment, ICP antenna is to be electromagnetically coupled to a plasma.