Segmented ICP Coil Structure for Stable High-Pressure Plasma
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Solution Overview
Problem
Conventional inductive coil structures for generating inductively-coupled plasma (ICP) suffer from low discharge stability and plasma density, particularly at atmospheric or high pressures, due to issues with capacitive coupling and voltage increases.
Innovation Solution
An inductive coil structure with a voltage division design, incorporating series-connected inductive coils and auxiliary capacitors, along with main capacitors at both ends, to distribute voltage and stabilize the discharge, while maintaining resonance frequency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the winding number of the inductive coil is increased to improve plasma density, then the plasma density increases, but the voltage increases excessively causing discharge instability
Solution Approach 1:
The inductive coil is divided into multiple sections with capacitors inserted between them, creating a segmented structure. This segmentation allows the total voltage to be distributed across multiple capacitor-inductor units, preventing excessive voltage buildup while maintaining high winding density for plasma generation
Solution Approach 2:
Capacitors are introduced as intermediary elements between coil windings to mediate the voltage distribution. These capacitors act as voltage dividers that prevent excessive voltage accumulation while allowing the coil to maintain high inductance for efficient plasma coupling
2Device complexity
If the inductive coil structure is simplified to reduce device complexity, then the manufacturing cost decreases, but the discharge stability and plasma efficiency deteriorate
Solution Approach 1:
The coil is segmented into modular units with capacitors, where each unit can be independently designed and assembled. This modular approach maintains structural simplicity while achieving the complex voltage distribution pattern needed for stable discharge
Solution Approach 2:
The design changes the electrical parameters (capacitance values, winding densities) of each segment to optimize performance. By adjusting these parameters, the system achieves stable discharge without requiring overly complex structural arrangements
3Productivity
If the number of windings per unit length is increased to improve plasma generation efficiency, then the inductance increases, but capacitive coupling effects increase causing discharge instability
Solution Approach 1:
Capacitors are placed as intermediary elements between closely spaced windings to control and balance the capacitive coupling effects. These capacitors provide a controlled electrical path that prevents harmful capacitive coupling while allowing tight winding spacing for high inductance
Solution Approach 2:
The capacitor network is designed to create equipotential regions between coil sections, reducing potential differences that drive capacitive coupling currents. This allows high winding density without the destabilizing effects of excessive capacitive coupling
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed structure enhances discharge stability and plasma efficiency, allowing ICP generation at high pressures without damaging the dielectric tube, and enables efficient plasma production even at high power levels.
Implementation Method 1
a first inductive coil structure provided to enclose the dielectric tube and to produce ICP in the dielectric tube
Implementation Method 2
auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils
Implementation Method 3
inductively-coupled plasma (ICP) generation system
Data Source
AI summary
An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.