Segmented Liner Gas Flow Uniformity in Semiconductor Batch Processing

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Solution Overview

Problem

Non-uniform gas flow during semiconductor substrate processing leads to control and adjustability issues, thermal uniformity, and deposition uniformity challenges, particularly in complex deposition operations.

Innovation Solution

A process kit for a processing chamber comprising an injector with multiple inject openings and liners with strategically positioned inlet and outlet openings, facilitating uniform gas flow distribution and independent control of gas zones for improved processing uniformity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional gas flow systems are used in batch processing, then device complexity is reduced, but gas flow uniformity and deposition uniformity deteriorate

Engineering Contradiction:
Improvedeposition uniformityVSAvoidgas flow system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The gas flow system is segmented into multiple independent zones using a segmented liner structure with multiple inlet openings and outlet openings. Each zone can be independently controlled to deliver uniform gas flow distribution across the substrate surface, resolving the contradiction between simplified device structure and uniform deposition control.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the liner are designed with different opening configurations to provide locally optimized gas flow characteristics. The liner includes multiple inlet openings at different positions and outlet openings strategically placed to ensure uniform gas distribution in each local region, achieving overall deposition uniformity through local quality control.

Inventive Principle:
Principle #3Local quality

2Ease of manufacture

If simple liner structures are used, then ease of manufacture is improved, but gas flow control and thermal uniformity deteriorate

Engineering Contradiction:
Improveliner manufacturing easeVSAvoidgas flow control reliability
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The liner is designed as a segmented structure with multiple standardized inlet and outlet openings that can be manufactured using consistent processes. This segmentation allows for reliable gas flow control while maintaining manufacturing simplicity through modular design elements.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The liner structure serves multiple functions simultaneously: it distributes gas flow uniformly, provides thermal management, and enables zonal control. The same segmented liner structure with its pattern of openings achieves all these functions without requiring separate components, improving ease of manufacture while maintaining reliability.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Manufacturing precision

If uniform gas flow is achieved through complex injector designs, then gas flow uniformity is improved, but device complexity and cost increase

Engineering Contradiction:
Improvegas flow uniformityVSAvoidinjector structure complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The liner acts as an intermediary component between the gas supply system and the substrate. Instead of making the injector complex to achieve uniform gas flow, the simple liner structure with its strategically positioned openings serves as the mediating element that transforms the gas flow into a uniform distribution pattern.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The system achieves gas flow uniformity by changing the parameters of the liner openings (position, size, configuration) rather than changing the injector structure. The inlet and outlet openings are designed with specific geometric parameters that naturally produce uniform gas flow distribution without requiring complex injector mechanisms.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20240254627A1Injectors, liners, process kits, processing chambers, and related methods for gas flow in batch processing of semiconductor manufacturing
Publication Date: 2024.08.01 APPLIED MATERIALS INC
  • US20240254627A1 patent drawing
  • US20240254627A1 patent drawing
  • US20240254627A1 patent drawing

AI summary

Embodiments of the present disclosure relate to injectors, liners, process kits, processing chambers, and related methods for gas flow in batch processing operations. In one or more embodiments, the liners facilitate gas flow uniformity in batch processing. In one or more embodiments, a liner includes a plurality of inlet openings on an inlet side, the plurality of inlet openings extending into an outer face of the liner. The plurality of inlet openings include a plurality of first inlet openings that include a first row extending into a first side face, and a second row extending into a second side face. The plurality of inlet openings include a plurality of second inlet openings extending between an inner face and the outer face. The liner includes one or more outlet openings on an outlet side. The outlet side opposes the inlet side. The one or more outlet openings extend into the inner face.