Segmented Park Electrodes for Ion Beam Deflection
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Solution Overview
Problem
In ion implantation processes, particles adhering to park electrodes can cause discharges, scattering particles towards the beamline, potentially affecting semiconductor wafer implantation by deflecting the ion beam.
Innovation Solution
The beam park device incorporates a pair of park electrodes with spaced electrode bodies to prevent particle adhesion, using an electric field to deflect the ion beam into a beam dump, reducing the likelihood of particle scattering.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a continuous park electrode surface is used to deflect the ion beam, then the beam deflection function is effective, but particles adhere to the electrode surface causing discharges and particle scattering
Solution Approach 1:
The park electrode is divided into multiple discrete electrode bodies spaced apart from each other, transforming the continuous surface into a segmented structure. This segmentation prevents particles from adhering to the electrode surfaces by eliminating continuous flat surfaces, thereby reducing discharges and particle scattering while maintaining beam deflection functionality through the electric fields generated by each electrode body.
Solution Approach 2:
The electrode bodies are arranged in a spatial configuration that extends into the third dimension, positioned at specific distances from the beamline and spaced apart from each other. This three-dimensional arrangement creates electric fields that effectively deflect the ion beam while preventing particle adhesion, adding a spatial dimension to the solution that addresses both beam control and particle suppression.
2Measurement precision
If park electrodes are positioned close to the beamline for effective beam control, then beam deflection precision is improved, but particle scattering risk increases
Solution Approach 1:
By segmenting the park electrode into multiple electrode bodies positioned at optimized distances from the beamline, the design achieves precise beam control through coordinated electric fields while reducing particle adhesion surfaces. The segmented structure allows for precise beam deflection without the continuous surface that causes particle scattering.
Solution Approach 2:
The spaced electrode bodies act as intermediaries that generate electric fields to control the ion beam without providing continuous surfaces for particle adhesion. The electric fields serve as the mediating mechanism that transfers control authority to the beam while preventing direct contact between particles and electrode surfaces.
3Device complexity
If a single large electrode surface is used, then the device structure is simple, but particle adhesion causes discharges and beam instability
Solution Approach 1:
The park electrode is divided into multiple electrode bodies spaced apart from each other, transforming the continuous surface into a segmented structure. This segmentation prevents particles from adhering to the electrode surfaces by eliminating continuous flat surfaces, thereby reducing discharges and particle scattering while maintaining beam deflection functionality through the electric fields generated by each electrode body.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively suppresses particle scattering, ensuring consistent and accurate ion implantation by preventing particle adhesion and discharge on the park electrodes.
Implementation Method 1
the beam park device includes a pair of park electrodes which faces each other across the beamline, and a beam dump which is provided away from the beamline in a facing direction of the pair of park electrodes and on a downstream side of the pair of park electrodes in a beamline direction. At least one of the pair of park electrodes includes a plurality of electrode bodies which are disposed to be spaced apart from each other in a predetermined direction perpendicular to both a direction in which the beamline extends and the facing direction.
Data Source
AI summary
An ion implanter having a beam park device on the way of a beamline through which an ion beam is transported toward a wafer is provided. The beam park device includes a pair of park electrodes which faces each other across the beamline, and a beam dump which is provided away from the beamline in a facing direction of the pair of park electrodes and on a downstream side of the pair of park electrodes in a beamline direction. At least one of the pair of park electrodes includes a plurality of electrode bodies which are disposed to be spaced apart from each other in a predetermined direction perpendicular to both a direction in which the beamline extends and the facing direction, and each of the plurality of electrode bodies extends from an upstream side toward the downstream side in the beamline direction.