Segmented Reference Electrode for Uniform Current Density Control

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Solution Overview

Problem

In electroplating processes, achieving a uniform current density across the substrate during immersion is challenging, particularly due to variations in potential distribution and the design of conventional reference electrodes, which can lead to uneven deposition and potential perturbations in the electrolyte.

Innovation Solution

The use of a dynamically changeable reference electrode with various shapes, such as ring or arc configurations, and segmented designs, along with controlled positioning and conductivity, allows for precise monitoring and adjustment of the potential difference between the substrate and the reference electrode, ensuring consistent current density distribution.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a conventional reference electrode is used during substrate immersion, then the electroplating process can be carried out, but the current density distribution becomes non-uniform and potential perturbations occur in the electrolyte

Engineering Contradiction:
Improvecurrent density uniformityVSAvoidpotential distribution stability
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The reference electrode is divided into multiple independent segments that can be individually activated or deactivated. This segmentation allows the system to optimize current density distribution by selectively engaging specific segments during different phases of substrate immersion, thereby preventing potential perturbations while maintaining uniform current density across the substrate surface.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The reference electrode system transitions from a static conventional design to a dynamic configuration where segments can be independently controlled. The controller dynamically adjusts which segments are active based on substrate position and immersion depth, enabling real-time optimization of current density uniformity and potential distribution throughout the electroplating process.

Inventive Principle:
Principle #15Dynamics

2Measurement precision

If the reference electrode is positioned to monitor the substrate entry point, then current density control is improved, but the electrode design becomes more complex

Engineering Contradiction:
Improvepotential difference monitoring accuracyVSAvoidreference electrode design complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The reference electrode is divided into multiple independent segments that can be individually activated or deactivated. This segmentation allows the system to optimize current density distribution by selectively engaging specific segments during different phases of substrate immersion, thereby preventing potential perturbations while maintaining uniform current density across the substrate surface.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The segmented reference electrode serves multiple functions: it monitors potential at the substrate entry point, controls current density during immersion, and can be dynamically reconfigured for different process stages. This multi-functionality is achieved through the controller's ability to independently manage each segment, eliminating the need for separate monitoring and control systems.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Manufacturing precision

If a ring-shaped or arc-shaped reference electrode is used, then current density control during angled immersion is improved, but the electrode geometry becomes more complex

Engineering Contradiction:
Improveelectroplated film uniformityVSAvoidreference electrode geometry
Core Design Contradiction:
Manufacturing precisionVSShape

Solution Approach 1:

The reference electrode is divided into multiple independent segments that can be individually activated or deactivated. This segmentation allows the system to optimize current density distribution by selectively engaging specific segments during different phases of substrate immersion, thereby preventing potential perturbations while maintaining uniform current density across the substrate surface.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different segments of the reference electrode can provide different local characteristics optimized for specific regions. The segmented design allows each portion of the electrode to contribute differently to the overall current density distribution, with each segment potentially having optimized geometry or positioning for its local function, thereby achieving uniform plating across the entire substrate.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables more accurate control of current density across the substrate, reducing variations and improving the uniformity of electroplated films, even during angled immersion, thereby enhancing the quality and consistency of the electroplating process.

Implementation Method 1

monitoring a potential difference between the substrate and a reference electrode

Methodology Applied
Scientific EffectElectrochemical potential measurement: Electrolysis

Implementation Method 2

electroplating metal onto the substrate

Methodology Applied
Scientific EffectElectrodeposition: Electrodeposition

Implementation Method 3

electroplating is used to deposit a thicker layer of copper over the seed layer

Methodology Applied
Scientific EffectElectrochemical reduction: Electrolysis

Data Source

PatentUS10689774B2Control of current density in an electroplating apparatus
Publication Date: 2020.06.23 LAM RES CORP
  • US10689774B2 patent drawing
  • US10689774B2 patent drawing
  • US10689774B2 patent drawing

AI summary

Various embodiments herein relate to methods and apparatus for electroplating metal onto substrates. In various cases, a reference electrode may be modified to promote improved electroplating results. The modifications may relate to one or more of the reference electrode's shape, position, relative conductivity compared to the electrolyte, or other design feature. In some particular examples the reference electrode may be dynamically changeable, for example having a changeable shape and/or position. In a particular example the reference electrode may be made of multiple segments. The techniques described herein may be combined as desired for individual applications.