Segmented Ring Member Layout for Uniform Edge Plasma Treatment
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Solution Overview
Problem
In substrate treating apparatuses using plasma, thermal expansion of components like the chuck and insulation ring can lead to misalignment, causing damage to the ring and reducing plasma uniformity, especially during processes like Bevel Etch where precise plasma generation at the edge region is required.
Innovation Solution
A substrate treating apparatus design where the chuck and ring member share the same center, with the ring member having a cut surface and holding members to limit movement, and a different thermal expansion rate than the chuck, minimizing damage and maintaining plasma uniformity by alleviating thermal expansion forces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the chuck and insulation ring are disposed with certain tolerance to prevent damage to the insulation ring, then the insulation ring is protected from thermal expansion damage, but the centers of the chuck and insulation ring cannot be matched, causing asymmetrical structure and imprecise plasma generation
Solution Approach 1:
The ring member is divided into two separate ring sections that can be independently positioned and adjusted. This segmentation allows each section to be precisely aligned with the chuck center while maintaining tolerance for thermal expansion, resolving the contradiction between protection and precision.
Solution Approach 2:
The first and second ring sections are nested together to form the complete ring member structure. This nesting allows for precise center alignment while accommodating thermal expansion through the modular design, enabling both protection and precision to be achieved simultaneously.
2Manufacturing precision
If the centers of the chuck and insulation ring are matched precisely, then plasma can be generated precisely in the required region, but the thermal expansion of the chuck causes damage to the insulation ring
Solution Approach 1:
By dividing the ring member into two separable sections, the structure can be precisely aligned with the chuck center for accurate plasma generation, while the segmented design allows for controlled movement and stress distribution during thermal expansion, preventing damage.
Solution Approach 2:
The ring member sections are designed to be movable relative to each other, allowing the structure to dynamically adjust during thermal expansion. This dynamic capability enables precise center alignment during operation while accommodating expansion forces without causing damage.
3Stability of the object's composition
If a holding member is added to fix the position of the divided ring member, then the ring member position is stabilized, but the structural complexity of the apparatus increases
Solution Approach 1:
The ring member is divided into sections that can be independently positioned and held by simple holding members. This segmentation allows for stable positioning using minimal structural additions, avoiding excessive complexity while achieving the desired stability.
Solution Approach 2:
The holding member acts as an intermediary element that simply maintains the position of the ring sections without requiring complex mechanisms. This straightforward intermediary approach provides stability while adding minimal structural complexity to the overall apparatus.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures uniform plasma generation at the edge region of the substrate while minimizing damage to the ring member, maintaining precision and plasma treatment consistency.
Implementation Method 1
A plasma refers to an ionized gas state consisting of ions, radicals, and electrons. The plasma is produced by a very high temperature, a strong electric field, or a high-frequency electromagnetic field.
Implementation Method 2
The plasma is produced by a very high temperature, a strong electric field, or a high-frequency electromagnetic field.
Implementation Method 3
When the substrate is treated using the plasma, a high-temperature atmosphere is created in a region at which the plasma is generated. Accordingly, members positioned adjacent to the region at which plasma is generated are thermally expanded.
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having a treating space; a support unit configured to support a substate within the treating space; and a plasma source for generating a plasma by exciting a gas supplied to the treating space, and wherein the support unit includes: a chuck having the substrate mounted to a top surface thereof; and a ring member in a ring shape surrounding an outer side of the chuck, and the ring member includes a cut surface which divides the ring member and a holding member positioned at the cut surface which holds a position of the ring member which is divided by the cut surface.