Segmented Ring Mask for Lithography Edge Definition
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Solution Overview
Problem
Existing methods for preventing irradiation of the outer region of a substrate during lithography, such as using a ring of opaque material, face challenges including contamination risks, inaccurate edge definition, and time constraints due to the need for large mask movements and precise placement.
Innovation Solution
A masking apparatus comprising a plurality of discrete segments arranged to form a continuous ring-shaped mask positioned between the outer region of a substrate and the illumination system, allowing for precise control and reduced contamination risks by minimizing the distance and complexity of mask movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a continuous ring mask is used to prevent irradiation of the outer substrate region, then the edge definition accuracy is improved, but the contamination risk increases due to large mask movements required for placement and removal
Solution Approach 1:
The continuous ring mask is divided into multiple discrete segments that can be independently positioned and removed. This segmentation allows the mask segments to be placed only at the extreme outer edges of the substrate, minimizing the distance they need to travel and reducing the risk of contamination during mask handling and placement.
2Manufacturing precision
If a continuous ring mask is used to prevent irradiation of the outer substrate region, then the edge definition accuracy is improved, but the time required for mask placement and removal increases
Solution Approach 1:
The ring mask is segmented into multiple independent sections that can be quickly positioned and removed without requiring complex alignment procedures. This segmentation reduces the time required for mask operations while maintaining accurate edge definition.
Solution Approach 2:
The mask segments are pre-positioned at the extreme outer edges of the substrate before the exposure process begins. This preliminary positioning eliminates the need for complex real-time alignment during exposure, reducing the overall time required for mask placement and removal.
3Manufacturing precision
If a continuous ring mask is used to prevent irradiation of the outer substrate region, then the edge definition accuracy is improved, but the device complexity increases due to the need for precise mask placement mechanisms
Solution Approach 1:
The ring mask is divided into multiple independent segments that can be positioned using simpler mechanisms compared to positioning a single continuous ring. This segmentation reduces the complexity of the placement mechanism while maintaining accurate edge definition.
Solution Approach 2:
The mask segments are positioned only at the extreme outer edges of the substrate where masking is most critical. This localized approach simplifies the overall masking system by concentrating the masking function only where it is most needed, rather than requiring complex mechanisms to position a continuous ring across the entire substrate.
Data Source
AI summary
A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.