Segmented Substrate Heating for Uniform IPA Drying Temperature
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Solution Overview
Problem
Existing substrate drying apparatuses face challenges in achieving uniform substrate surface temperature and heating efficiency, particularly when using IPA as a rinsing liquid, which can lead to pattern collapse due to high surface tension and inefficient heating.
Innovation Solution
A substrate treatment apparatus with a rotating unit and a heating unit comprising fluid supply pipes and cartridges that heat the substrate's bottom surface, combined with a control unit using temperature sensors and mass flow meters to regulate temperature uniformly across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If water is used as the rinsing liquid, then the rinsing effect is good, but the surface tension of the water film is too high which causes pattern collapse
Solution Approach 1:
The patent changes the chemical composition parameter of the rinsing liquid from water to IPA (isopropyl alcohol), which has different surface tension properties. This parameter change allows the liquid to wet the substrate effectively while having lower surface tension that prevents pattern collapse during the drying process.
2Object-affected harmful factors
If heating module is added to heat the substrate, then the surface tension of IPA is reduced preventing pattern collapse, but the substrate surface temperature uniformity and heating efficiency are insufficient
Solution Approach 1:
The heating system is segmented into multiple independent heating zones, each with its own heating element and temperature control. This allows different regions of the substrate to be heated independently, achieving uniform temperature distribution across the entire substrate surface and improving heating efficiency.
Solution Approach 2:
Each heating zone is designed with local temperature control capabilities, allowing the temperature to be optimized for specific regions of the substrate. This ensures that each area receives appropriate heating to maintain uniform temperature and prevent pattern collapse in different zones.
3Device complexity
If existing heating module is used, then the apparatus structure is simple, but it cannot meet the requirements of substrate surface temperature uniformity and heating efficiency
Solution Approach 1:
The heating module is divided into multiple segmented heating zones with independent control, which improves heating efficiency and temperature uniformity while maintaining a relatively simple overall structure through modular design.
Solution Approach 2:
The heating system incorporates dynamic temperature control for each zone, allowing real-time adjustment of heating parameters to optimize heating efficiency and maintain uniform temperature distribution across the substrate.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus ensures high substrate heating efficiency and rapid temperature regulation, preventing pattern collapse by maintaining uniform temperatures across the substrate during the drying process.
Implementation Method 1
the fluid cartridges configured to heat a bottom surface of the substrate
Implementation Method 2
a rotating unit, configured to drive the holding unit and the substrate to rotate around a vertical line passing through the center of the substrate
Data Source
AI summary
Disclosed in an embodiment of the present invention is a substrate heating apparatus, comprising a holding unit, a rotating unit, a heating unit, and a control unit. The heating unit comprises multiple fluid supply pipes and multiple groups of fluid cartridges, a substrate region heated by the fluid cartridges in the same group is a circular ring or a circle, and substrate regions heated by the fluid cartridges in different groups are not overlapped with each other and are concentric. The control unit can measure and adjust the temperatures of the substrate regions in real time. Because the structure of the heating unit is optimally designed and the control unit is added, the substrate heating apparatus of the present invention can adjust the temperatures of the regions on the substrate in real time, so that the temperatures of the regions on the substrate tend to be consistent, and high substrate heating efficiency and high temperature adjustment response speed are achieved. Further disclosed in another embodiment of the present invention is a substrate drying apparatus.