Selective Gas Injection and Extraction Apparatus for Substrate Processing
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Solution Overview
Problem
In substrate processing, reaction byproducts flowing across the top surface of the substrate can alter the composition of process gases, leading to non-uniformities and exacerbated effects at the substrate's edge due to accumulation near the exhaust port.
Innovation Solution
A gas injection and extraction apparatus with apertures and tubes that allow for selective gas injection and extraction above the substrate, preventing byproducts from flowing across the substrate surface by using a vacuum source to remove them efficiently through interstices between the apertures and tubes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the exhaust port is disposed below the substrate plane to evacuate reaction byproducts, then the evacuation function is achieved, but the reaction byproducts flow across the top surface of the substrate causing process non-uniformities
Solution Approach 1:
The invention transitions from a single-plane exhaust configuration to a three-dimensional dual-plane system. Gas injection conduits are positioned above the substrate while extraction conduits are positioned below the substrate, creating vertical separation of functions. This dimensional change allows simultaneous injection and extraction without cross-contamination, eliminating the flow of reaction byproducts across the substrate surface while maintaining efficient evacuation.
2Productivity
If the exhaust port is positioned to remove reaction byproducts, then byproduct removal is achieved, but byproducts accumulate at the substrate edge closest to the exhaust port
Solution Approach 1:
The invention segments the gas handling system into distinct injection and extraction zones. Multiple gas injection conduits are distributed across the substrate surface, and multiple extraction conduits are positioned below the substrate. This segmentation creates numerous localized extraction points that prevent accumulation at any single location, including substrate edges. The segmented approach maintains uniform gas composition by distributing both injection and extraction functions across multiple spatial locations.
3Productivity
If reaction byproducts flow across the substrate surface to reach the exhaust port, then evacuation is achieved, but the composition of process gases changes at various points across the substrate
Solution Approach 1:
The invention introduces a plenum chamber as an intermediary component between the gas injection conduits and the substrate. The plenum distributes process gases uniformly across the substrate surface before they reach the substrate, and simultaneously serves as a collection point for reaction byproducts that are then evacuated through separate extraction conduits below the substrate. This intermediary structure decouples the injection and extraction pathways, preventing direct flow of byproducts across the substrate surface while maintaining uniform gas distribution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures a more uniform process by quickly and efficiently removing reaction byproducts, reducing their impact on subsequent reactions and maintaining gas composition uniformity across the substrate.
Implementation Method 1
a vacuum source fluidly coupled to each of the interstices
Data Source
AI summary
Methods and apparatus for selective gas injection and extraction for use in a substrate processing chamber are provided herein. In some embodiments, a gas injection and extraction apparatus includes a plate having a plurality of apertures through a thickness of the plate, each aperture of the plurality of apertures having an aperture wall; a plurality of tubes, each tube partially disposed within one of the plurality of apertures, wherein a disposed portion of each of the tubes is spaced apart from at least a portion of the aperture wall of the aperture in which it is disposed, thereby forming an interstice between at least a portion of the aperture wall and the disposed portion of the tube; a gas supply fluidly coupled to each of the tubes; and a vacuum source fluidly coupled to each of the interstices.