Self-Centering Edge Ring Assembly for Precise Plasma Alignment
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Solution Overview
Problem
Existing substrate processing systems face challenges in maintaining accurate centering and alignment of edge rings due to wear and vibration during robotic transfer, leading to non-uniform plasma treatment and potential contamination.
Innovation Solution
A self-centering edge ring system with complementary chamfered surfaces on the edge and middle rings, along with a moving ring mechanism, ensures precise alignment and minimizes shifting during transfer and placement, using a middle ring and bottom ring configuration to maintain concentricity and support the edge ring.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the edge ring is transferred using robotic manipulation, then productivity is improved through automated handling, but manufacturing precision deteriorates due to vibration and misalignment during transfer
Solution Approach 1:
The middle ring and edge ring are designed with self-centering chamfered surfaces that automatically align the edge ring with the substrate during placement. The complementary chamfers (45-degree angle on middle ring, matching angle on edge ring) create a self-correcting mechanism that eliminates the need for high-precision robotic positioning, allowing robust automated handling while maintaining sub-millimeter alignment accuracy.
2Manufacturing precision
If the edge ring is held fixed during processing, then manufacturing precision is maintained, but adaptability deteriorates due to inability to adjust for wear and contamination
Solution Approach 1:
The edge ring is designed with a movable mounting system that allows dynamic adjustment of its position relative to the substrate. The middle ring includes movable components that enable the edge ring to be repositioned radially and axially, allowing the system to adapt to wear, contamination, or process variations while maintaining precise alignment through the self-centering chamfer mechanism during each processing cycle.
3Device complexity
If the edge ring is designed with simple support structure, then device complexity is reduced, but reliability deteriorates due to instability and shifting during processing
Solution Approach 1:
The middle ring and edge ring incorporate asymmetric chamfered surfaces with specific geometric relationships (45-degree angles, complementary profiles) that create inherent mechanical guidance. This asymmetric geometry provides stable self-centering through geometric constraints rather than complex active control systems, achieving reliable positioning with a simple passive support structure.
Data Source
AI summary
An edge ring system for a substrate processing chamber includes a middle ring configured for arrangement around a substrate support. The edge ring system includes an outer ring portion, an inner ring portion, N arcuate openings arranged between the outer ring portion and the inner ring portion, where N is an integer greater than 1, N bridges connecting the outer ring portion and the inner ring portion between the N arcuate openings, and an annular cavity arranged on a radially inner surface of the outer ring portion. A cover ring is arranged in the annular cavity. A top edge ring is arranged above the middle ring between the cover ring and the inner ring portion and above the N arcuate openings and the N bridges of the middle ring.