Self-centering Process Shield Pin Alignment

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Solution Overview

Problem

Current physical vapor deposition (PVD) chambers face inaccuracies in aligning the process shield and target, which worsen with increasing RF energy frequencies, leading to plasma irregularities and arc events that negatively impact deposition quality.

Innovation Solution

The design incorporates an elongated annular process shield with a radially extending lip and pins to align the target atop the shield, featuring a beveled peripheral edge and concave sidewall, ensuring precise concentric placement and reducing arcing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If separate alignment features are used between target and process shield, then assembly flexibility is maintained, but alignment precision deteriorates

Engineering Contradiction:
Improveassembly flexibilityVSAvoidalignment precision
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The alignment features are merged directly into the target structure itself, eliminating separate alignment components. The target includes integrated alignment features that directly engage with corresponding features on the process shield, ensuring precise alignment while maintaining assembly flexibility.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

Alignment pins serve as intermediary elements between the target and process shield. These pins physically bridge the two components, providing a mechanical interface that ensures accurate concentric alignment while allowing for easy assembly and disassembly.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If RF energy frequency is increased to improve deposition efficiency, then productivity increases, but plasma irregularity increases due to alignment sensitivity

Engineering Contradiction:
Improvedeposition efficiencyVSAvoidplasma stability
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent replaces mechanical alignment adjustments with a precision-machined alignment feature system. The target and process shield include precisely machined surfaces and features that automatically ensure accurate alignment when assembled, eliminating the need for manual mechanical adjustments and ensuring consistent alignment at high RF frequencies.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Ease of repair

If target and process shield are separately mounted to maintain modularity, then ease of repair is improved, but alignment accuracy deteriorates

Engineering Contradiction:
Improvecomponent modularityVSAvoidalignment accuracy
Core Design Contradiction:
Ease of repairVSManufacturing precision

Solution Approach 1:

The system maintains segmentation by allowing the target and process shield to be separate, removable components. However, each component includes integrated alignment features that ensure precise alignment when assembled, enabling both modularity for easy replacement and high alignment accuracy for reliable operation.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS9644262B2Self-centering process shield
Publication Date: 2017.05.09 APPLIED MATERIALS INC
  • US9644262B2 patent drawing
  • US9644262B2 patent drawing
  • US9644262B2 patent drawing

AI summary

A process shield may include an elongated annular body having an outer surface and an inner surface; a lip extending radially outward from the outer surface of the body proximate a first end of the body such that a first portion of the body extends beyond the lip toward the first end; a plurality of openings in the lip; and a pin disposed in each of the plurality of openings to align the target assembly atop the process shield when the lid is placed atop the process shield, wherein the pin comprises an elongated body having a first surface with a beveled peripheral edge, wherein the first surface has a first diameter, a second surface opposing the first surface, wherein the second surface has a second diameter, and a sidewall, between the first surface and the second surface, wherein the sidewall has a concave portion having a third diameter.