Self-Cleaning Roll Mechanism for Semiconductor Substrate Processing
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Solution Overview
Problem
Current self-cleaning methods for roll cleaning tools in semiconductor manufacturing, such as inner rinsing and using a cleaning plate, are ineffective in preventing back contamination and offer limited control over self-cleaning timing and duration, leading to reduced cleaning efficacy and potential wear on the cleaning tools.
Innovation Solution
A substrate cleaning apparatus with a self-cleaning member mounted on an arm that can move between contact and separation positions, allowing for arbitrary timing self-cleaning of the cleaning member, combined with a moving mechanism and a cleaning liquid supply system to enhance cleaning effectiveness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a roll cleaning tool is used for substrate cleaning, then cleaning efficiency is improved, but back contamination occurs when particles accumulate and reattach to the substrate
Solution Approach 1:
The patent applies preliminary action by performing self-cleaning of the roll cleaning tool at predetermined intervals during the substrate cleaning process. The controller is configured to execute self-cleaning operations before back contamination can occur, thereby preventing particle accumulation and reattachment to substrates while maintaining continuous production efficiency
2Reliability
If self-cleaning is performed frequently to prevent back contamination, then cleaning effectiveness is improved, but wear on the cleaning member increases
Solution Approach 1:
The patent implements periodic action by configuring the controller to perform self-cleaning operations at predetermined intervals rather than continuously. This periodic self-cleaning approach maintains cleaning effectiveness by removing particles before they cause back contamination, while simultaneously reducing the frequency of cleaning operations to minimize wear on the roll cleaning tool and extend its service life
3Productivity
If the roll cleaning tool remains in standby position, then substrate processing continues, but particles accumulate on the tool surface
Solution Approach 1:
The patent applies continuity of useful action by integrating self-cleaning operations into the standby period of the roll cleaning tool. The controller is configured to automatically execute self-cleaning when the tool is not actively cleaning substrates, thereby maintaining tool cleanliness during idle periods without interrupting substrate processing continuity. This ensures particles are removed before they can accumulate and cause back contamination
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables effective prevention of back contamination, extends the life of the cleaning member, and allows for flexible self-cleaning timing and duration, ensuring high cleaning efficacy and reduced wear on the tools.
Implementation Method 1
passing a cleaning liquid from an interior to an exterior of a roll sponge, thereby cleaning the roll sponge
Implementation Method 2
The particles that have been removed from the substrate are absorbed or accumulated in the roll cleaning tool
Data Source
AI summary
A substrate cleaning apparatus for cleaning a substrate while rotating the substrate and placing a cleaning member in contact with the rotating substrate is disclosed. The substrate cleaning apparatus comprises: a self-cleaning member mounted to an arm supporting the cleaning member, the self-cleaning member being configured to come into contact with the cleaning member to perform self-cleaning of the cleaning member; and a moving mechanism mounted to the arm supporting the cleaning member, the moving mechanism being configured to move the self-cleaning member between a position where the self-cleaning member is in contact with the cleaning member and a position where the self-cleaning member is separated from the cleaning member.