Scanning Electron Microscope Shielding Plate for High-Resolution Imaging
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Solution Overview
Problem
Conventional scanning electron microscopes face challenges in obtaining high-resolution and high-contrast images of surface unevennesses on semiconductor wafers, particularly as defect sizes become finer during advanced semiconductor manufacturing processes.
Innovation Solution
The scanning electron microscope design includes an electron source, object lens, conductor plate, detector, acceleration-electric-field generating unit, and a shielding plate to focus and accelerate primary and secondary electrons, enhancing image resolution and contrast by controlling electric and magnetic fields to improve detection efficiency of signal electrons.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional scanning electron microscope configuration is used, then device complexity is reduced, but image resolution and contrast deteriorate
Solution Approach 1:
The electron detection system is segmented into multiple specialized detectors: a first detector for detecting primary secondary electrons and a second detector for detecting backscattered electrons. This segmentation allows each detector to be optimized for specific electron types, improving overall image resolution and contrast without requiring a complete system redesign
Solution Approach 2:
A converter is introduced as an intermediary component between the sample and the detectors. The converter converts incident electron beams into light, enabling optical detection methods to be applied to electron microscopy. This intermediary approach improves detection capability while maintaining relatively simple device architecture
2Measurement precision
If conventional scanning electron microscope configuration is used, then device complexity is reduced, but image contrast deteriorates
Solution Approach 1:
The detection system is divided into multiple detectors with specialized functions: the first detector captures primary secondary electrons while the second detector captures backscattered electrons. This segmentation enables independent optimization of detection parameters for each electron type, significantly improving image contrast through combined signal processing
Solution Approach 2:
Different regions of the detection system are assigned different functional qualities: the first detector region is optimized for primary secondary electron detection while the second detector region is optimized for backscattered electron detection. This local quality differentiation maximizes contrast enhancement while minimizing overall system complexity
3Measurement precision
If optical apparatus is used for defect inspection, then device complexity is low, but measurement precision deteriorates
Solution Approach 1:
A converter is introduced as an intermediary that transforms electron beam interactions into light signals. This allows optical detection systems to be used in electron microscopy, achieving high defect detection precision by combining the high-resolution capability of electron beams with the detection simplicity of optical systems
Solution Approach 2:
The patent replaces direct electron detection mechanisms with an optical detection system using a converter. This substitution maintains high measurement precision for defect inspection while reducing device complexity by using well-established optical detection technology instead of complex electron detection electronics
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for the acquisition of high-resolution and high-contrast images of surface unevennesses, improving defect detection accuracy and production line stability in semiconductor manufacturing.
Implementation Method 1
an electron source which generates a primary electron beam
Implementation Method 2
an object lens by which the primary electron beam is focused onto a sample
Implementation Method 3
signal electrons generated from the sample
Implementation Method 4
an acceleration-electric-field generating unit which generates an acceleration electric field for accelerating the signal electrons
Implementation Method 5
a conductor plate, with which signal electrons generated from the sample collide; a detector which detects secondary electrons generated from the conductor plate
Data Source
AI summary
A scanning electron microscope, by which an image of unevennesses on the surface of a sample may be obtained in a high-resolution manner and a high contrast one, is provided according to the present invention. A sample image is obtained by use of the scanning electron microscope with a configuration in which a positive voltage is applied in order to accelerate a primary electron beam, and an electric field shielding plate, a magnetic field shielding plate, or an electromagnetic field shielding plate is arranged on the upper side of an object lens.