Automated SEM Recipe Creation Using Design Data
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Solution Overview
Problem
The existing methods for creating recipes for scanning electron microscopes (SEM) are manual, time-consuming, and require actual wafer imaging, leading to low operation rates and increased operator burden, especially as semiconductor patterns become more complex and miniaturized.
Innovation Solution
An automated method for creating SEM recipes using design data, which allows for waferless, offline recipe creation, considers both user-designated evaluation points and the specifications of the measurement tool, and enables sharing of recipes and data among multiple SEM devices.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If manual recipe creation methods are used for SEM, then operators can create recipes with actual wafer imaging, but the process becomes time-consuming and reduces operation rates
Solution Approach 1:
The patent uses design data (GDSII, OASIS, or DB formats) as a digital copy of the actual circuit pattern to create recipes automatically. This eliminates the need for manual wafer imaging and operator intervention, thereby increasing operation rates while maintaining measurement accuracy through automated parameter extraction from the design data
Solution Approach 2:
The system performs preliminary analysis of design data to automatically determine evaluation points, measurement points, and imaging parameters before actual SEM operation. This pre-processing step creates ready-to-use recipes that can be directly executed, significantly reducing operational time while ensuring accurate measurement setup
2Reliability
If manual recipe creation is performed, then operators can adjust recipes based on actual wafer observations, but the operator burden increases and efficiency decreases
Solution Approach 1:
The system performs self-service by automatically analyzing design data to extract all necessary recipe parameters including evaluation points, measurement points, imaging conditions, and analysis parameters. This automated self-configuration eliminates operator burden while ensuring recipe accuracy through systematic data processing
Solution Approach 2:
The system incorporates feedback mechanisms where measurement results from actual wafers are compared against design data, and recipe parameters are automatically adjusted based on this feedback. This closed-loop approach maintains high reliability while reducing operator intervention to minimal oversight
3Measurement precision
If actual wafer imaging is required for recipe creation, then accurate measurement parameters can be obtained, but time is lost and operation rates decrease
Solution Approach 1:
The system creates accurate measurement parameters by processing digital copies (design data) of the circuit patterns instead of requiring physical wafer imaging. This digital copying approach eliminates time loss while maintaining parameter accuracy through automated extraction of evaluation points, measurement points, and imaging conditions from the design data
Solution Approach 2:
All recipe parameters are determined in advance through preliminary automated analysis of design data before actual SEM operation begins. This pre-determination of evaluation points, measurement points, and imaging parameters eliminates time loss during operation while ensuring accuracy through systematic data processing
4Productivity
If multiple SEM devices are used, then productivity increases, but recipe management and data sharing become more complex
Solution Approach 1:
The system creates universal recipes from design data that can be executed on any SEM device without device-specific customization. This multi-functionality approach allows the same recipe to work across multiple devices, simplifying recipe management while enabling increased throughput through parallel processing on multiple devices
Solution Approach 2:
Recipes created from design data serve as digital copies that can be replicated and distributed to multiple SEM devices identically. This copying approach ensures consistency across devices while simplifying management, as the same digital recipe file can be loaded on any device without manual adjustment
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces operator correction needs, improves measurement accuracy, and increases SEM operation efficiency by automating recipe creation, allowing for quick and accurate imaging and measurement of complex patterns across multiple devices.
Implementation Method 1
scanning electron microscope means for imaging the circuit pattern formed on the substrate
Data Source
AI summary
In the dimension measurement of a circuit pattern using a scanning electron microscope (SEM), in order to make it possible to automatically image desired evaluation points (EPs) on a sample, and automatically measure the circuit pattern formed at the evaluation points, according to the present invention, in the dimension measurement of a circuit pattern using a scanning electron microscope (SEM), it is arranged that coordinate data of the EP and design data of the circuit pattern including the EP are used as an input, creation of a dimension measurement cursor for measuring the pattern existing in the EP and selection or setting of the dimension measurement method are automatically performed based on the EP coordinate data and the design data to automatically create a recipe, and automatic imaging/measurement is performed using the recipe.