Semiconductor By-Product Trap With Segmented Temperature Zones
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Solution Overview
Problem
Current semiconductor manufacturing processes face challenges in efficiently trapping reaction by-product mixtures with different temperature requirements, leading to increased exhaust pressure, vacuum pump breakdowns, and contamination, as existing trapping apparatuses struggle to handle multiple deposition processes with varying by-product temperatures.
Innovation Solution
A single apparatus with a trapping region division part that controls gas flow to separate and trap reaction by-products as thin films at high temperatures using a first internal trapping tower and as powders at low temperatures using a second internal trapping tower, within a housing equipped with a hot/cold heater and coolant flow path for temperature adjustment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single trapping apparatus is used to trap multiple reaction by-products with different temperature requirements, then device complexity is reduced, but trapping efficiency deteriorates because different by-products require different temperature regions
Solution Approach 1:
The single trapping apparatus is divided into multiple trapping regions (first trapping region and second trapping region) with different temperature zones. The first trapping region maintains a temperature suitable for trapping first reaction by-products, while the second trapping region maintains a different temperature for trapping second reaction by-products. This segmentation allows the single apparatus to handle multiple by-products efficiently without requiring multiple separate devices.
Solution Approach 2:
Different regions within the trapping apparatus are assigned different thermal properties to match the specific requirements of different reaction by-products. The first trapping region is heated to a temperature optimal for condensing first by-products, while the second trapping region is heated to a different temperature optimal for second by-products. This local quality differentiation enables efficient trapping of diverse by-products in a single device.
2Reliability
If multiple trapping apparatuses are provided for different temperature regions, then trapping efficiency is improved, but device complexity and process control complexity increase
Solution Approach 1:
Multiple trapping functions that would traditionally require separate apparatuses are merged into a single integrated trapping device. The apparatus includes multiple trapping regions (first and second trapping regions) that can simultaneously trap different reaction by-products at different temperatures. This merging reduces device complexity while maintaining high trapping efficiency through the coordinated operation of multiple temperature zones within one device.
Solution Approach 2:
The single trapping apparatus is designed to perform multiple trapping functions simultaneously. It can trap first reaction by-products in the first trapping region while also trapping second reaction by-products in the second trapping region, making it a universal device capable of handling various by-product types with different temperature requirements in one apparatus.
3Device complexity
If reaction by-products are not trapped in advance, then the process is simpler, but harmful effects increase including pipe adhesion, vacuum pump breakdown, and wafer contamination
Solution Approach 1:
The trapping apparatus is positioned in the gas discharge path between the process chamber and vacuum pump to preliminarily trap reaction by-products before they can cause harmful effects. By condensing and collecting particulate by-products in advance, the system prevents pipe adhesion, vacuum pump breakdown, and potential wafer contamination, addressing the harmful effects before they occur.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for efficient trapping of reaction by-products in different forms, reducing maintenance cycles for the vacuum pump and extending its durability, while simplifying the semiconductor manufacturing process and maintaining cleanliness.
Implementation Method 1
a hot/cold heater (2) and a coolant flow path (14) are provided in the housing (1) to adjust a temperature of the housing (1)
Implementation Method 2
a coolant performs thermal conduction while circulating to adjust an outer surface temperature of the housing
Implementation Method 3
a trapping region division part (3) is provided in the housing (1) to control a flow of the introduced unreacted gas
Implementation Method 4
trapping a reaction by-product aggregated in the form of a thin film in a relatively high-temperature region by using a first internal trapping tower (4)
Implementation Method 5
trapping a reaction by-product aggregated in the form of powder in a relatively low-temperature region by using a second internal trapping tower (5)
Data Source
AI summary
The present disclosure relates to an apparatus for trapping multiple reaction by-products for a semiconductor process, in which in order to separate, with the single trapping apparatus, reaction by-product mixtures contained in unreacted gases discharged after a process of depositing multiple different thin film layers is performed in a process chamber during a semiconductor manufacturing process, a trapping region division part is provided, which divides a heat distribution region into trapping regions for respective reaction by-products while controlling a flow in a movement direction of an introduced unreacted gas, thereby trapping a reaction by-product aggregated in the form of a thin film in a relatively high-temperature region by using a first internal trapping tower in a front region, and trapping a reaction by-product aggregated in the form of powder in a relatively low-temperature region by using a second internal trapping tower in a rear region.


