Semiconductor Package Bonding Structure With Anchor Layers
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Solution Overview
Problem
Manufacturing reliable and strong bonds between hybrid bonding structures in IC die packages is challenging due to inadequate surface planarity and high temperature anneal processes, leading to weak fusion bonds and susceptibility to delamination.
Innovation Solution
The implementation of top and bottom hybrid bonding structures with anchor layers, including a metallic layer and intermetallic compound (IMC) layers, which promote stronger bonds and reduce delamination, while allowing for lower bonding process temperatures and shorter planarization times.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If high temperature anneal processes are used to bond hybrid bonding structures, then bonding strength is improved, but susceptibility to delamination increases and manufacturing reliability deteriorates
Solution Approach 1:
An anchor layer is introduced as an intermediary between the first and second conductive pads. This anchor layer promotes metallurgical bonding and reduces delamination susceptibility during high temperature anneal processes, thereby maintaining manufacturing reliability while achieving strong bonds.
Solution Approach 2:
The bonding structure uses composite material composition including copper or copper alloy for conductive pads and specific anchor layer materials that form intermetallic compounds. This composite approach enables strong bonding while controlling delamination through material selection.
2Device complexity
If conventional bonding structures without anchor layers are used, then device complexity is reduced, but bonding strength decreases and delamination susceptibility increases
Solution Approach 1:
The anchor layer serves as a mediator that enhances bonding strength by promoting metallurgical bonding between conductive pads. Despite adding one more layer, the overall complexity increase is minimal while the bonding strength improvement is significant.
3Reliability
If extended planarization times are used to achieve better surface planarity, then bonding reliability is improved, but manufacturing productivity decreases
Solution Approach 1:
Surface planarity is prepared in advance during the formation of the anchor layer and conductive structures, before the bonding process. This preliminary planarization allows for faster subsequent bonding operations while maintaining high reliability.
Solution Approach 2:
The bonding process parameters are optimized to achieve reliable bonds with reduced planarization time requirements. The anchor layer composition and structure are adjusted to enable effective bonding with shorter processing times.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in stronger, more reliable bonds between conductive structures with reduced susceptibility to delamination, improving the integrity and manufacturing efficiency of IC die packages.
Implementation Method 1
The anchor layer can include a metallic layer and an intermetallic compound (IMC) layer
Implementation Method 2
The anchor layer can include a metallic layer and an intermetallic compound (IMC) layer
Implementation Method 3
depositing a first conductive layer with a first layer portion in the first opening and a second layer portion extending over a top surface of the first dielectric layer
Data Source
AI summary
Various embodiments of an integrated circuit (IC) die package are disclosed. An IC die package includes an IC die, an interposer structure electrically connected to the IC die, a first bonding structure, and a second bonding structure. The first bonding structure includes a first dielectric layer disposed on the IC die and also includes a first conductive pad having an embedded portion disposed in the first dielectric layer and an anchor portion extending over a top surface of the first dielectric layer. The second bonding structure includes a second dielectric layer disposed on the interposer structure, a second conductive pad disposed in the second dielectric layer, and an anchor layer surrounding the anchor portion.


